JPS5724275A - Thermal head and manufacture thereof - Google Patents

Thermal head and manufacture thereof

Info

Publication number
JPS5724275A
JPS5724275A JP9952480A JP9952480A JPS5724275A JP S5724275 A JPS5724275 A JP S5724275A JP 9952480 A JP9952480 A JP 9952480A JP 9952480 A JP9952480 A JP 9952480A JP S5724275 A JPS5724275 A JP S5724275A
Authority
JP
Japan
Prior art keywords
layer
heating element
manufacture
thermal head
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9952480A
Other languages
Japanese (ja)
Inventor
Hiroshi Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Shiojiri Kogyo KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Shiojiri Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK, Shiojiri Kogyo KK filed Critical Seiko Epson Corp
Priority to JP9952480A priority Critical patent/JPS5724275A/en
Publication of JPS5724275A publication Critical patent/JPS5724275A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enhance the oxidation resistance of a heating element and the reliability of a product without increasing the cost in the manufacture of a thermal head used for an electrosensitive recorder, by a method wherein tantalum is coated on a substrate in an oxidizing atmosphere so as to forcibly oxidize the heating element.
CONSTITUTION: On the substrate 1 which is previously provided with a protuberant layer 6 as required, a current passing type tantalum-based heating element 2' is formed by sputtering or vacuum deposition. In this case, an appropriate oxidizing atmosphere is used in the apparatus for forming the element 2' so as to forcibly oxidize the element 2'. Thereafter, an electrode layer 3, an antioxidizing layer 4 and an abrasion-resisting layer 5 are sequentially formed. Since the oxidation resistance of the heating element 2' is previously enhanced, the antioxidizing layer 4 can be made thinner.
COPYRIGHT: (C)1982,JPO&Japio
JP9952480A 1980-07-21 1980-07-21 Thermal head and manufacture thereof Pending JPS5724275A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9952480A JPS5724275A (en) 1980-07-21 1980-07-21 Thermal head and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9952480A JPS5724275A (en) 1980-07-21 1980-07-21 Thermal head and manufacture thereof

Publications (1)

Publication Number Publication Date
JPS5724275A true JPS5724275A (en) 1982-02-08

Family

ID=14249614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9952480A Pending JPS5724275A (en) 1980-07-21 1980-07-21 Thermal head and manufacture thereof

Country Status (1)

Country Link
JP (1) JPS5724275A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4612433A (en) * 1983-12-28 1986-09-16 Pentel Kabushiki Kaisha Thermal head and manufacturing method thereof
US4742362A (en) * 1985-10-23 1988-05-03 Alps Electric Co., Ltd. Thermal head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4612433A (en) * 1983-12-28 1986-09-16 Pentel Kabushiki Kaisha Thermal head and manufacturing method thereof
US4742362A (en) * 1985-10-23 1988-05-03 Alps Electric Co., Ltd. Thermal head

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