JPS5723253B2 - - Google Patents
Info
- Publication number
- JPS5723253B2 JPS5723253B2 JP3326474A JP3326474A JPS5723253B2 JP S5723253 B2 JPS5723253 B2 JP S5723253B2 JP 3326474 A JP3326474 A JP 3326474A JP 3326474 A JP3326474 A JP 3326474A JP S5723253 B2 JPS5723253 B2 JP S5723253B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3326474A JPS5723253B2 (US08124317-20120228-C00018.png) | 1974-03-25 | 1974-03-25 | |
| DE19752512933 DE2512933C2 (de) | 1974-03-25 | 1975-03-24 | Lichtempfindliche Flachdruckplatte |
| US05/756,653 US4123279A (en) | 1974-03-25 | 1977-01-04 | Light-sensitive o-quinonediazide containing planographic printing plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3326474A JPS5723253B2 (US08124317-20120228-C00018.png) | 1974-03-25 | 1974-03-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50125806A JPS50125806A (US08124317-20120228-C00018.png) | 1975-10-03 |
| JPS5723253B2 true JPS5723253B2 (US08124317-20120228-C00018.png) | 1982-05-18 |
Family
ID=12381649
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3326474A Expired JPS5723253B2 (US08124317-20120228-C00018.png) | 1974-03-25 | 1974-03-25 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS5723253B2 (US08124317-20120228-C00018.png) |
| DE (1) | DE2512933C2 (US08124317-20120228-C00018.png) |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5280022A (en) * | 1975-12-26 | 1977-07-05 | Fuji Photo Film Co Ltd | Light solubilizable composition |
| DE2616992A1 (de) * | 1976-04-17 | 1977-11-03 | Agfa Gevaert Ag | Lichtempfindliches material zur herstellung von druckformen und aetzresistagen |
| JPS54116218A (en) * | 1978-03-02 | 1979-09-10 | Oji Paper Co | Photosensitive composition |
| JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
| JPS5557841A (en) * | 1978-10-20 | 1980-04-30 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS55129341A (en) * | 1979-03-29 | 1980-10-07 | Daicel Chem Ind Ltd | Photosensitive covering composition |
| JPS561045A (en) * | 1979-06-16 | 1981-01-08 | Konishiroku Photo Ind Co Ltd | Photosensitive composition |
| JPS56140342A (en) * | 1980-04-02 | 1981-11-02 | Tokyo Ohka Kogyo Co Ltd | Image forming composition and formation of resist image |
| DE3107109A1 (de) * | 1981-02-26 | 1982-09-09 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial |
| JPS5986046A (ja) * | 1982-11-10 | 1984-05-18 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS5988734A (ja) * | 1982-11-12 | 1984-05-22 | Fuji Photo Film Co Ltd | 感光性組成物 |
| JPS5997146A (ja) * | 1982-11-26 | 1984-06-04 | Asahi Shinbunsha:Kk | 感光性平版印刷版 |
| JPS61193145A (ja) * | 1985-02-21 | 1986-08-27 | Japan Synthetic Rubber Co Ltd | ネガ型レジスト |
| JPS62136636A (ja) * | 1985-12-10 | 1987-06-19 | Nec Corp | ネガレジスト |
| JPH0654390B2 (ja) * | 1986-07-18 | 1994-07-20 | 東京応化工業株式会社 | 高耐熱性ポジ型ホトレジスト組成物 |
| JP2800217B2 (ja) * | 1989-01-11 | 1998-09-21 | ジェイエスアール株式会社 | 集積回路製造用感放射線性樹脂組成物 |
| JPH02254450A (ja) * | 1989-03-29 | 1990-10-15 | Toshiba Corp | レジスト |
| DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
| JP3063148B2 (ja) * | 1989-12-27 | 2000-07-12 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
| TW202504B (US08124317-20120228-C00018.png) * | 1990-02-23 | 1993-03-21 | Sumitomo Chemical Co | |
| DE4013575C2 (de) * | 1990-04-27 | 1994-08-11 | Basf Ag | Verfahren zur Herstellung negativer Reliefkopien |
| JPH0656488B2 (ja) * | 1990-05-01 | 1994-07-27 | 日本合成ゴム株式会社 | ポジ型感光性樹脂組成物 |
| US5773194A (en) | 1995-09-08 | 1998-06-30 | Konica Corporation | Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate |
| JP4527509B2 (ja) | 2003-12-26 | 2010-08-18 | 岡本化学工業株式会社 | 平版印刷版用アルミニウム支持体および平版印刷版用原版 |
| EP2042339B1 (en) | 2007-09-26 | 2013-05-22 | FUJIFILM Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| EP2042338A3 (en) | 2007-09-26 | 2010-03-10 | Fujifilm Corporation | Fountain solution composition for lithographic printing and heatset offset rotary printing process |
| JP2009083106A (ja) | 2007-09-27 | 2009-04-23 | Fujifilm Corp | 平版印刷版用版面保護剤及び平版印刷版の製版方法 |
| JP5089422B2 (ja) | 2008-02-15 | 2012-12-05 | 岡本化学工業株式会社 | 感光性組成物およびそれを用いた平版印刷版用原版 |
| JP2009234247A (ja) | 2008-03-07 | 2009-10-15 | Fujifilm Corp | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5288268B2 (ja) | 2009-03-25 | 2013-09-11 | 富士フイルム株式会社 | 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法 |
| JP5281130B2 (ja) | 2011-07-05 | 2013-09-04 | 富士フイルム株式会社 | 平版印刷用湿し水組成物 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2146167A1 (de) * | 1970-09-16 | 1972-03-23 | Konismroku Photo Industry Co , Ltd, Tokio | Lichtempfindliche Masse |
| JPS4863802A (US08124317-20120228-C00018.png) * | 1971-12-13 | 1973-09-05 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1522478B1 (de) * | 1965-12-17 | 1971-07-29 | Polychrome Corp | Vorsensibilisierte, positiv arbeitende Flachdruckplatte |
| US3666473A (en) * | 1970-10-06 | 1972-05-30 | Ibm | Positive photoresists for projection exposure |
-
1974
- 1974-03-25 JP JP3326474A patent/JPS5723253B2/ja not_active Expired
-
1975
- 1975-03-24 DE DE19752512933 patent/DE2512933C2/de not_active Expired
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2146167A1 (de) * | 1970-09-16 | 1972-03-23 | Konismroku Photo Industry Co , Ltd, Tokio | Lichtempfindliche Masse |
| JPS4863802A (US08124317-20120228-C00018.png) * | 1971-12-13 | 1973-09-05 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2512933A1 (de) | 1975-10-02 |
| DE2512933C2 (de) | 1983-11-10 |
| JPS50125806A (US08124317-20120228-C00018.png) | 1975-10-03 |
