JPS57210974A - Vapor depositing device for electrode of piezoelectric oscillator - Google Patents
Vapor depositing device for electrode of piezoelectric oscillatorInfo
- Publication number
- JPS57210974A JPS57210974A JP9731281A JP9731281A JPS57210974A JP S57210974 A JPS57210974 A JP S57210974A JP 9731281 A JP9731281 A JP 9731281A JP 9731281 A JP9731281 A JP 9731281A JP S57210974 A JPS57210974 A JP S57210974A
- Authority
- JP
- Japan
- Prior art keywords
- oscillator
- mask
- arm
- vacuum chamber
- piezoelectric oscillator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
PURPOSE:To facilitate the position adjustment of an oscillator and a mask and to improve working efficiency by providing an intermediate moving part mounted with the oscillator and the mask movably by means of an arm and a turning shaft between a stationary part and a cover part of a vacuum chamber. CONSTITUTION:A vacuum chamber 1 consists of a stationary part 2 which has an air release hole 4, and is fixed internally with an electric heater and a boat 6' serving also as a crucible, a cover part 3 mounted vertically movably by the operation of a pneumatic piston 20, and an intermediate moving part 13 mounted airtightly between these via an O-ring. The part 13 is fixed with a vapor deposition mask 8 and a piezoelectric oscillator 9 in its inside respectively by fixing means 14, 10, and is made rotatable by means of an arm 18 and a turning shaft 19. The operator replaces the oscillator 9 by turning the part 13 to arbitrary positions or adjust the positions of the mask 8 with a fine adjusting screw 17 while observing the same from below by using a means such as VTR camera (not shown).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9731281A JPS597783B2 (en) | 1981-06-22 | 1981-06-22 | Electrode deposition equipment for piezoelectric vibrators |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9731281A JPS597783B2 (en) | 1981-06-22 | 1981-06-22 | Electrode deposition equipment for piezoelectric vibrators |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57210974A true JPS57210974A (en) | 1982-12-24 |
JPS597783B2 JPS597783B2 (en) | 1984-02-21 |
Family
ID=14188962
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9731281A Expired JPS597783B2 (en) | 1981-06-22 | 1981-06-22 | Electrode deposition equipment for piezoelectric vibrators |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS597783B2 (en) |
-
1981
- 1981-06-22 JP JP9731281A patent/JPS597783B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS597783B2 (en) | 1984-02-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5210869A (en) | Thin film forming method | |
JPS57210974A (en) | Vapor depositing device for electrode of piezoelectric oscillator | |
JPS6236634B2 (en) | ||
JPS57134559A (en) | Physical vapor deposition device | |
FR2419523A1 (en) | Vacuum plating rig for aspheric optical surfaces - has three masks controlling deposition from electron bombarded source | |
JPS54125967A (en) | Crystal growth method | |
JPS5678422A (en) | Preparation of electrically conductive transparent thin film | |
JPS547288A (en) | Observation window for sealed container | |
GB2015581A (en) | Improvements in or relating to sputtering | |
JPS5662965A (en) | Sputtering apparatus | |
JPS57149467A (en) | Movable mask-type vacuum evaporation | |
JPS57169082A (en) | Continuous vacuum vapor-depositing method | |
JPS5439736A (en) | Operating mechanism of remote controller for engine | |
JPS56125650A (en) | Sample holding device | |
JPS54109241A (en) | Polluted gas control apparatus | |
JPS54100987A (en) | Ion plating device | |
JPS53146742A (en) | Device for powder coating | |
JPS575330A (en) | Specimen cassette for microminiature machining apparatus | |
JPS55159147A (en) | Production of sensor | |
JPS54142966A (en) | Electron gun | |
JPS57110665A (en) | Heating mechanism for vacuum apparatus | |
JPS56118252A (en) | Photographing device for electron microscope | |
JPS5566847A (en) | Electron microscope with sample preparing apparatus | |
JPS57181373A (en) | Vacuum deposition device | |
JPS5226151A (en) | Sample fine adjustmen device in electron microscopes |