JPS57210974A - Vapor depositing device for electrode of piezoelectric oscillator - Google Patents

Vapor depositing device for electrode of piezoelectric oscillator

Info

Publication number
JPS57210974A
JPS57210974A JP9731281A JP9731281A JPS57210974A JP S57210974 A JPS57210974 A JP S57210974A JP 9731281 A JP9731281 A JP 9731281A JP 9731281 A JP9731281 A JP 9731281A JP S57210974 A JPS57210974 A JP S57210974A
Authority
JP
Japan
Prior art keywords
oscillator
mask
arm
vacuum chamber
piezoelectric oscillator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9731281A
Other languages
Japanese (ja)
Other versions
JPS597783B2 (en
Inventor
Koichi Hirama
Hideo Takahashi
Tsukasa Ogiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOUYOU TSUUSHINKI KK
Toyo Communication Equipment Co Ltd
Original Assignee
TOUYOU TSUUSHINKI KK
Toyo Communication Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOUYOU TSUUSHINKI KK, Toyo Communication Equipment Co Ltd filed Critical TOUYOU TSUUSHINKI KK
Priority to JP9731281A priority Critical patent/JPS597783B2/en
Publication of JPS57210974A publication Critical patent/JPS57210974A/en
Publication of JPS597783B2 publication Critical patent/JPS597783B2/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)

Abstract

PURPOSE:To facilitate the position adjustment of an oscillator and a mask and to improve working efficiency by providing an intermediate moving part mounted with the oscillator and the mask movably by means of an arm and a turning shaft between a stationary part and a cover part of a vacuum chamber. CONSTITUTION:A vacuum chamber 1 consists of a stationary part 2 which has an air release hole 4, and is fixed internally with an electric heater and a boat 6' serving also as a crucible, a cover part 3 mounted vertically movably by the operation of a pneumatic piston 20, and an intermediate moving part 13 mounted airtightly between these via an O-ring. The part 13 is fixed with a vapor deposition mask 8 and a piezoelectric oscillator 9 in its inside respectively by fixing means 14, 10, and is made rotatable by means of an arm 18 and a turning shaft 19. The operator replaces the oscillator 9 by turning the part 13 to arbitrary positions or adjust the positions of the mask 8 with a fine adjusting screw 17 while observing the same from below by using a means such as VTR camera (not shown).
JP9731281A 1981-06-22 1981-06-22 Electrode deposition equipment for piezoelectric vibrators Expired JPS597783B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9731281A JPS597783B2 (en) 1981-06-22 1981-06-22 Electrode deposition equipment for piezoelectric vibrators

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9731281A JPS597783B2 (en) 1981-06-22 1981-06-22 Electrode deposition equipment for piezoelectric vibrators

Publications (2)

Publication Number Publication Date
JPS57210974A true JPS57210974A (en) 1982-12-24
JPS597783B2 JPS597783B2 (en) 1984-02-21

Family

ID=14188962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9731281A Expired JPS597783B2 (en) 1981-06-22 1981-06-22 Electrode deposition equipment for piezoelectric vibrators

Country Status (1)

Country Link
JP (1) JPS597783B2 (en)

Also Published As

Publication number Publication date
JPS597783B2 (en) 1984-02-21

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