JPS57207169A - Production of photoreceptor for electrophotography - Google Patents
Production of photoreceptor for electrophotographyInfo
- Publication number
- JPS57207169A JPS57207169A JP9175381A JP9175381A JPS57207169A JP S57207169 A JPS57207169 A JP S57207169A JP 9175381 A JP9175381 A JP 9175381A JP 9175381 A JP9175381 A JP 9175381A JP S57207169 A JPS57207169 A JP S57207169A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gaseous
- photoreceptor
- cleaned
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5093—Coaxial electrodes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08214—Silicon-based
- G03G5/08278—Depositing methods
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9175381A JPS57207169A (en) | 1981-06-15 | 1981-06-15 | Production of photoreceptor for electrophotography |
US06/387,221 US4438188A (en) | 1981-06-15 | 1982-06-10 | Method for producing photosensitive film for electrophotography |
DE3222491A DE3222491A1 (de) | 1981-06-15 | 1982-06-15 | Verfahren und vorrichtung zur herstellung eines lichtempfindlichen films auf einem substrat fuer elektrofotographie |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9175381A JPS57207169A (en) | 1981-06-15 | 1981-06-15 | Production of photoreceptor for electrophotography |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57207169A true JPS57207169A (en) | 1982-12-18 |
JPS619390B2 JPS619390B2 (ja) | 1986-03-22 |
Family
ID=14035291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9175381A Granted JPS57207169A (en) | 1981-06-15 | 1981-06-15 | Production of photoreceptor for electrophotography |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57207169A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63301051A (ja) * | 1987-06-01 | 1988-12-08 | Fujitsu Ltd | 感光体の製造方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52127766A (en) * | 1976-04-19 | 1977-10-26 | Fujitsu Ltd | Plasma etching unit |
JPS54121743A (en) * | 1978-03-14 | 1979-09-21 | Canon Inc | Electrophotographic image forming member |
-
1981
- 1981-06-15 JP JP9175381A patent/JPS57207169A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52127766A (en) * | 1976-04-19 | 1977-10-26 | Fujitsu Ltd | Plasma etching unit |
JPS54121743A (en) * | 1978-03-14 | 1979-09-21 | Canon Inc | Electrophotographic image forming member |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63301051A (ja) * | 1987-06-01 | 1988-12-08 | Fujitsu Ltd | 感光体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS619390B2 (ja) | 1986-03-22 |
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