JPS57204125A - Electron-ray drawing device - Google Patents
Electron-ray drawing deviceInfo
- Publication number
- JPS57204125A JPS57204125A JP56088183A JP8818381A JPS57204125A JP S57204125 A JPS57204125 A JP S57204125A JP 56088183 A JP56088183 A JP 56088183A JP 8818381 A JP8818381 A JP 8818381A JP S57204125 A JPS57204125 A JP S57204125A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- data
- outputted
- electron rays
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
- H01J37/3026—Patterning strategy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electron Beam Exposure (AREA)
- Lasers (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56088183A JPS57204125A (en) | 1981-06-10 | 1981-06-10 | Electron-ray drawing device |
EP82105022A EP0066882B1 (en) | 1981-06-10 | 1982-06-08 | Electron beam exposure system |
DE8282105022T DE3280306D1 (de) | 1981-06-10 | 1982-06-08 | Elektronenstrahl-belichtungsvorrichtung. |
US06/386,301 US4532598A (en) | 1981-06-10 | 1982-06-08 | Electron beam exposure system |
AT82105022T ATE60958T1 (de) | 1981-06-10 | 1982-06-08 | Elektronenstrahl-belichtungsvorrichtung. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56088183A JPS57204125A (en) | 1981-06-10 | 1981-06-10 | Electron-ray drawing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57204125A true JPS57204125A (en) | 1982-12-14 |
JPS6239818B2 JPS6239818B2 (ja) | 1987-08-25 |
Family
ID=13935786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56088183A Granted JPS57204125A (en) | 1981-06-10 | 1981-06-10 | Electron-ray drawing device |
Country Status (5)
Country | Link |
---|---|
US (1) | US4532598A (ja) |
EP (1) | EP0066882B1 (ja) |
JP (1) | JPS57204125A (ja) |
AT (1) | ATE60958T1 (ja) |
DE (1) | DE3280306D1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60196939A (ja) * | 1984-03-19 | 1985-10-05 | Fujitsu Ltd | 荷電粒子ビ−ム露光方法 |
JPS60198723A (ja) * | 1984-03-22 | 1985-10-08 | Toshiba Corp | 電子ビ−ム露光装置の描画デ−タ作成方法及びその装置 |
JPH02159014A (ja) * | 1988-12-13 | 1990-06-19 | Toshiba Corp | 荷電ビーム描画用データの作成方法及び作成装置 |
JP2012129479A (ja) * | 2010-12-17 | 2012-07-05 | Nuflare Technology Inc | 荷電粒子ビーム描画装置および描画データ生成方法 |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6246518A (ja) * | 1985-08-23 | 1987-02-28 | Toshiba Corp | 荷電ビ−ム描画方法 |
US4837447A (en) * | 1986-05-06 | 1989-06-06 | Research Triangle Institute, Inc. | Rasterization system for converting polygonal pattern data into a bit-map |
JPS63199421A (ja) * | 1987-02-16 | 1988-08-17 | Toshiba Corp | 荷電ビ−ム描画方法 |
US5030836A (en) * | 1988-08-05 | 1991-07-09 | Toshiba Machine Co., Ltd. | Method and apparatus for drawing patterns using an energy beam |
JPH0795269B2 (ja) * | 1988-11-04 | 1995-10-11 | 富士通株式会社 | 命令コードのデコード装置 |
JPH02210814A (ja) * | 1989-02-10 | 1990-08-22 | Fujitsu Ltd | 半導体装置の製造方法 |
US5434795A (en) * | 1990-01-11 | 1995-07-18 | Fujitsu Limited | Method of forming pattern having optical angle in charged particle exposure system |
US5493687A (en) | 1991-07-08 | 1996-02-20 | Seiko Epson Corporation | RISC microprocessor architecture implementing multiple typed register sets |
US5539911A (en) | 1991-07-08 | 1996-07-23 | Seiko Epson Corporation | High-performance, superscalar-based computer system with out-of-order instruction execution |
US5159201A (en) * | 1991-07-26 | 1992-10-27 | International Business Machines Corporation | Shape decompositon system and method |
US5251140A (en) * | 1991-07-26 | 1993-10-05 | International Business Machines Corporation | E-beam control data compaction system and method |
JP2501726B2 (ja) * | 1991-10-08 | 1996-05-29 | インターナショナル・ビジネス・マシーンズ・コーポレイション | コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法 |
US5371684A (en) * | 1992-03-31 | 1994-12-06 | Seiko Epson Corporation | Semiconductor floor plan for a register renaming circuit |
WO1993020505A2 (en) | 1992-03-31 | 1993-10-14 | Seiko Epson Corporation | Superscalar risc instruction scheduling |
JP3637920B2 (ja) | 1992-05-01 | 2005-04-13 | セイコーエプソン株式会社 | スーパースケーラマイクロプロセサに於て命令をリタイアさせるシステム及び方法 |
US5628021A (en) | 1992-12-31 | 1997-05-06 | Seiko Epson Corporation | System and method for assigning tags to control instruction processing in a superscalar processor |
DE69330889T2 (de) | 1992-12-31 | 2002-03-28 | Seiko Epson Corp | System und Verfahren zur Änderung der Namen von Registern |
US5446649A (en) * | 1992-12-31 | 1995-08-29 | International Business Machines Corporation | Data-hiding and skew scan for unioning of shapes in electron beam lithography post-processing |
JP2647000B2 (ja) * | 1994-05-25 | 1997-08-27 | 日本電気株式会社 | 電子ビームの露光方法 |
JP3549282B2 (ja) * | 1995-04-28 | 2004-08-04 | 株式会社ルネサステクノロジ | 荷電ビーム描画データ作成方法およびその作成装置 |
GB2334598B (en) * | 1995-04-28 | 1999-11-17 | Mitsubishi Electric Corp | A charged beam pattern data generating method and a charged beam pattern data generating apparatus |
JPH10270341A (ja) * | 1997-03-28 | 1998-10-09 | Jeol Ltd | 電子ビーム描画方法 |
JP4156700B2 (ja) * | 1998-03-16 | 2008-09-24 | 富士通株式会社 | 露光データ作成方法、露光データ作成装置、及び、記録媒体 |
JP4006216B2 (ja) * | 2001-10-26 | 2007-11-14 | 日本電子株式会社 | 可変面積型電子ビーム描画装置を用いた描画方法 |
US7229742B2 (en) * | 2004-04-14 | 2007-06-12 | Micron Technology, Inc. | Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system |
JP2016086102A (ja) * | 2014-10-27 | 2016-05-19 | キヤノン株式会社 | リソグラフィーシステム及び物品の製造方法 |
JP2016086103A (ja) * | 2014-10-27 | 2016-05-19 | キヤノン株式会社 | 描画装置、リソグラフィーシステム、パターンデータの作成方法、描画方法及び物品の製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5712520A (en) * | 1980-06-26 | 1982-01-22 | Nippon Telegr & Teleph Corp <Ntt> | Dividing method of figure by exposing in electron beam radiation |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3894271A (en) * | 1973-08-31 | 1975-07-08 | Ibm | Method and apparatus for aligning electron beams |
JPS5283177A (en) * | 1975-12-31 | 1977-07-11 | Fujitsu Ltd | Electron beam exposure device |
US4393312A (en) * | 1976-02-05 | 1983-07-12 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
JPS5412675A (en) * | 1977-06-30 | 1979-01-30 | Jeol Ltd | Electon beam exposure method |
US4147937A (en) * | 1977-11-01 | 1979-04-03 | Fujitsu Limited | Electron beam exposure system method and apparatus |
JPS5473577A (en) * | 1977-11-24 | 1979-06-12 | Fujitsu Ltd | Electron beam exposure method |
JPS5493364A (en) * | 1977-12-30 | 1979-07-24 | Fujitsu Ltd | Exposure system for electron beam |
US4167676A (en) * | 1978-02-21 | 1979-09-11 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
US4280186A (en) * | 1978-07-07 | 1981-07-21 | Tokyo Shibaura Denki Kabushiki Kaisha | Exposure apparatus using electron beams |
US4213053A (en) * | 1978-11-13 | 1980-07-15 | International Business Machines Corporation | Electron beam system with character projection capability |
US4424448A (en) * | 1979-12-26 | 1984-01-03 | Tokyo Shibaura Denki Kabushiki Kaisha | Electron beam apparatus |
-
1981
- 1981-06-10 JP JP56088183A patent/JPS57204125A/ja active Granted
-
1982
- 1982-06-08 US US06/386,301 patent/US4532598A/en not_active Expired - Lifetime
- 1982-06-08 EP EP82105022A patent/EP0066882B1/en not_active Expired - Lifetime
- 1982-06-08 AT AT82105022T patent/ATE60958T1/de not_active IP Right Cessation
- 1982-06-08 DE DE8282105022T patent/DE3280306D1/de not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5712520A (en) * | 1980-06-26 | 1982-01-22 | Nippon Telegr & Teleph Corp <Ntt> | Dividing method of figure by exposing in electron beam radiation |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60196939A (ja) * | 1984-03-19 | 1985-10-05 | Fujitsu Ltd | 荷電粒子ビ−ム露光方法 |
JPS60198723A (ja) * | 1984-03-22 | 1985-10-08 | Toshiba Corp | 電子ビ−ム露光装置の描画デ−タ作成方法及びその装置 |
JPH02159014A (ja) * | 1988-12-13 | 1990-06-19 | Toshiba Corp | 荷電ビーム描画用データの作成方法及び作成装置 |
JP2012129479A (ja) * | 2010-12-17 | 2012-07-05 | Nuflare Technology Inc | 荷電粒子ビーム描画装置および描画データ生成方法 |
Also Published As
Publication number | Publication date |
---|---|
EP0066882A3 (en) | 1985-06-05 |
EP0066882A2 (en) | 1982-12-15 |
DE3280306D1 (de) | 1991-03-28 |
ATE60958T1 (de) | 1991-03-15 |
EP0066882B1 (en) | 1991-02-20 |
JPS6239818B2 (ja) | 1987-08-25 |
US4532598A (en) | 1985-07-30 |
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