JPS57196745A - Substrate having deposited electrically conductive transparent film and its manufacture - Google Patents

Substrate having deposited electrically conductive transparent film and its manufacture

Info

Publication number
JPS57196745A
JPS57196745A JP56079678A JP7967881A JPS57196745A JP S57196745 A JPS57196745 A JP S57196745A JP 56079678 A JP56079678 A JP 56079678A JP 7967881 A JP7967881 A JP 7967881A JP S57196745 A JPS57196745 A JP S57196745A
Authority
JP
Japan
Prior art keywords
substrate
electrically conductive
transparent film
conductive transparent
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56079678A
Other languages
Japanese (ja)
Inventor
Hiroshi Ikeizumi
Shozaburo Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Sheet Glass Co Ltd
Original Assignee
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd
Priority to JP56079678A priority Critical patent/JPS57196745A/en
Publication of JPS57196745A publication Critical patent/JPS57196745A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Liquid Crystal (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PURPOSE:To manufacture a substrate having an easily patternable electrically conductive transparent film with superior thermal stability and electric characteristics by densely depositing an indium oxide-base electrically conductive transparent film on a substrate and further depositing an electrically conductive transparent film composed of coarse grains of indium oxide on said film. CONSTITUTION:A vacuum chamber 2 is filled with an atmosphere of a gaseous mixture of an inert gas such as Ar with O2 under low pressure. An indium-base target is used as a cathode 7, and a substrate is set on a support frame 8 and used as an anode. A DC voltage is applied between the cathode 7 and the substrate from a DC power source 10 to deposit an indium oxide-base electrically conductive transparent film on the substrate. After forming the dense film, by changing one or more among the pressure of the gaseous mixture, the concn. of O2 in the gaseous mixture, the DC voltage and the temp. of the substrate, an electrically conductive transparent film composed of coarse grains is formed.
JP56079678A 1981-05-26 1981-05-26 Substrate having deposited electrically conductive transparent film and its manufacture Pending JPS57196745A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56079678A JPS57196745A (en) 1981-05-26 1981-05-26 Substrate having deposited electrically conductive transparent film and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56079678A JPS57196745A (en) 1981-05-26 1981-05-26 Substrate having deposited electrically conductive transparent film and its manufacture

Publications (1)

Publication Number Publication Date
JPS57196745A true JPS57196745A (en) 1982-12-02

Family

ID=13696851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56079678A Pending JPS57196745A (en) 1981-05-26 1981-05-26 Substrate having deposited electrically conductive transparent film and its manufacture

Country Status (1)

Country Link
JP (1) JPS57196745A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61114844A (en) * 1984-11-09 1986-06-02 コニカ株式会社 Conductive laminate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61114844A (en) * 1984-11-09 1986-06-02 コニカ株式会社 Conductive laminate
JPH0218233B2 (en) * 1984-11-09 1990-04-24 Konishiroku Photo Ind

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