JPS5711811A - Preparation of carbide film resistor - Google Patents

Preparation of carbide film resistor

Info

Publication number
JPS5711811A
JPS5711811A JP8554980A JP8554980A JPS5711811A JP S5711811 A JPS5711811 A JP S5711811A JP 8554980 A JP8554980 A JP 8554980A JP 8554980 A JP8554980 A JP 8554980A JP S5711811 A JPS5711811 A JP S5711811A
Authority
JP
Japan
Prior art keywords
sputtering
carbide
film resistor
carbide film
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8554980A
Other languages
Japanese (ja)
Other versions
JPS6323267B2 (en
Inventor
Kazushi Yamamoto
Takeshi Nagai
Ikuo Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8554980A priority Critical patent/JPS5711811A/en
Publication of JPS5711811A publication Critical patent/JPS5711811A/en
Publication of JPS6323267B2 publication Critical patent/JPS6323267B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

PURPOSE:To prepare a low-cost carbide film resistor having low resistance, resistivity, etc., by adding a slight amount of impurity gas to the rare gas of the sputtering atmosphere, and sputtering the carbide film resistor material to the insulating substrate maintained at a definite temperature. CONSTITUTION:The insulating substrate 1, e.g. alumina, is provided with an electrode 2 made of electrically conductive paste such as Ag, etc. The substrate 2 is sputtered with a target material, e.g. sintered silicon carbide for carbide resistor. The sputtering is carried out at a substrate temperature of 500-800 deg.C, in a vacuum chamber evacuated to 10<-6> Torr under the sputtering pressure of e.g. 10<-2> Torr. Rare gas, e.g. Ar gas, introduced into the vacuum chamber is incorporated with a slight amount of impurity gas such as air. The carbide film resistor obtained by the process has the same composition as the carbide resistor material. The sputtering time is shortened, and the adjustment of the resistance of the product, etc. are also facilitated in this process.
JP8554980A 1980-06-23 1980-06-23 Preparation of carbide film resistor Granted JPS5711811A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8554980A JPS5711811A (en) 1980-06-23 1980-06-23 Preparation of carbide film resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8554980A JPS5711811A (en) 1980-06-23 1980-06-23 Preparation of carbide film resistor

Publications (2)

Publication Number Publication Date
JPS5711811A true JPS5711811A (en) 1982-01-21
JPS6323267B2 JPS6323267B2 (en) 1988-05-16

Family

ID=13861919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8554980A Granted JPS5711811A (en) 1980-06-23 1980-06-23 Preparation of carbide film resistor

Country Status (1)

Country Link
JP (1) JPS5711811A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60106960A (en) * 1983-09-23 1985-06-12 カロライナ・コーテイング・テクノロジーズ・インコーポレイテツド Random coating, formation thereof and method of machining workpiece by tool coated thereby

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60106960A (en) * 1983-09-23 1985-06-12 カロライナ・コーテイング・テクノロジーズ・インコーポレイテツド Random coating, formation thereof and method of machining workpiece by tool coated thereby

Also Published As

Publication number Publication date
JPS6323267B2 (en) 1988-05-16

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