JPS57194530A - Positioning of photomask substrate - Google Patents

Positioning of photomask substrate

Info

Publication number
JPS57194530A
JPS57194530A JP56079389A JP7938981A JPS57194530A JP S57194530 A JPS57194530 A JP S57194530A JP 56079389 A JP56079389 A JP 56079389A JP 7938981 A JP7938981 A JP 7938981A JP S57194530 A JPS57194530 A JP S57194530A
Authority
JP
Japan
Prior art keywords
mask
mark
detection
matching mark
grid line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56079389A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6148252B2 (enrdf_load_stackoverflow
Inventor
Kenichi Kuroishi
Yoshihisa Furuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56079389A priority Critical patent/JPS57194530A/ja
Publication of JPS57194530A publication Critical patent/JPS57194530A/ja
Publication of JPS6148252B2 publication Critical patent/JPS6148252B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56079389A 1981-05-27 1981-05-27 Positioning of photomask substrate Granted JPS57194530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56079389A JPS57194530A (en) 1981-05-27 1981-05-27 Positioning of photomask substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56079389A JPS57194530A (en) 1981-05-27 1981-05-27 Positioning of photomask substrate

Publications (2)

Publication Number Publication Date
JPS57194530A true JPS57194530A (en) 1982-11-30
JPS6148252B2 JPS6148252B2 (enrdf_load_stackoverflow) 1986-10-23

Family

ID=13688501

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56079389A Granted JPS57194530A (en) 1981-05-27 1981-05-27 Positioning of photomask substrate

Country Status (1)

Country Link
JP (1) JPS57194530A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1126507A3 (en) * 2000-02-14 2002-07-24 Shinko Electric Industries Co. Ltd. Apparatus for positioning a thin plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1126507A3 (en) * 2000-02-14 2002-07-24 Shinko Electric Industries Co. Ltd. Apparatus for positioning a thin plate

Also Published As

Publication number Publication date
JPS6148252B2 (enrdf_load_stackoverflow) 1986-10-23

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