JPS57193073A - Semiconductor radioactive ray detector - Google Patents

Semiconductor radioactive ray detector

Info

Publication number
JPS57193073A
JPS57193073A JP56077853A JP7785381A JPS57193073A JP S57193073 A JPS57193073 A JP S57193073A JP 56077853 A JP56077853 A JP 56077853A JP 7785381 A JP7785381 A JP 7785381A JP S57193073 A JPS57193073 A JP S57193073A
Authority
JP
Japan
Prior art keywords
region
type
leakage current
electrode
junction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56077853A
Other languages
Japanese (ja)
Inventor
Kimii Sumino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUJI DENKI SOUGOU KENKYUSHO KK
Fuji Electric Co Ltd
Original Assignee
FUJI DENKI SOUGOU KENKYUSHO KK
Fuji Electric Co Ltd
Fuji Electric Corporate Research and Development Ltd
Fuji Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUJI DENKI SOUGOU KENKYUSHO KK, Fuji Electric Co Ltd, Fuji Electric Corporate Research and Development Ltd, Fuji Electric Manufacturing Co Ltd filed Critical FUJI DENKI SOUGOU KENKYUSHO KK
Priority to JP56077853A priority Critical patent/JPS57193073A/en
Publication of JPS57193073A publication Critical patent/JPS57193073A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/115Devices sensitive to very short wavelength, e.g. X-rays, gamma-rays or corpuscular radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Measurement Of Radiation (AREA)
  • Light Receiving Elements (AREA)

Abstract

PURPOSE:To obtain a semiconductor radioactive ray detector which is not affected by the influence of a reverse leakage current in the detector by providing a high impurity density region at the periphery of a P-N junction or a barrier metal and producing the reverse leakage current from the electrode covered on the high impurity density region. CONSTITUTION:As an example of a radiation detector using a P-N junction type diode structure, a P-type layer 3 is grown on a P<+>type Si substrate 2, an N-type region 4 is diffused in the layer 3. Then an SiO2 6 is covered on the overall surface including the region 4, a window is opened, an electrode 5 is mounted on the exposed region 4, as a P-N junction diode. In this structure, holes are opened at the film 6 at both sides of the region 4, a P<+>type region 8 is diffused at the film 6, and electrodes 9 are mounted. In this manner, most of reverse leakage current is flowed to the electrode 9, and S/N ratio is largely improved.
JP56077853A 1981-05-22 1981-05-22 Semiconductor radioactive ray detector Pending JPS57193073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56077853A JPS57193073A (en) 1981-05-22 1981-05-22 Semiconductor radioactive ray detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56077853A JPS57193073A (en) 1981-05-22 1981-05-22 Semiconductor radioactive ray detector

Publications (1)

Publication Number Publication Date
JPS57193073A true JPS57193073A (en) 1982-11-27

Family

ID=13645613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56077853A Pending JPS57193073A (en) 1981-05-22 1981-05-22 Semiconductor radioactive ray detector

Country Status (1)

Country Link
JP (1) JPS57193073A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108367A (en) * 1982-12-13 1984-06-22 Fuji Electric Corp Res & Dev Ltd Semiconductor radiation dosimeter
KR100545801B1 (en) * 1997-02-10 2006-04-21 필 팩토리 Electromagnetic radiation detectors, high sensitivity pixel structures using such detectors and methods of manufacturing such detectors.
JP2018505396A (en) * 2014-12-19 2018-02-22 コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ Method and neutron detector for realizing a neutron detector

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59108367A (en) * 1982-12-13 1984-06-22 Fuji Electric Corp Res & Dev Ltd Semiconductor radiation dosimeter
KR100545801B1 (en) * 1997-02-10 2006-04-21 필 팩토리 Electromagnetic radiation detectors, high sensitivity pixel structures using such detectors and methods of manufacturing such detectors.
JP2018505396A (en) * 2014-12-19 2018-02-22 コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ Method and neutron detector for realizing a neutron detector

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