JPS5459891A - Photo detector - Google Patents

Photo detector

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Publication number
JPS5459891A
JPS5459891A JP12695177A JP12695177A JPS5459891A JP S5459891 A JPS5459891 A JP S5459891A JP 12695177 A JP12695177 A JP 12695177A JP 12695177 A JP12695177 A JP 12695177A JP S5459891 A JPS5459891 A JP S5459891A
Authority
JP
Japan
Prior art keywords
junction
traps
photons
electrons
absorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12695177A
Other languages
Japanese (ja)
Inventor
Koji Tomita
Shiyunkou Takagi
Tadaaki Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP12695177A priority Critical patent/JPS5459891A/en
Publication of JPS5459891A publication Critical patent/JPS5459891A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To increase the sensitivity of external outputs and spectral sensitivity regions by providing a PN junction in the group III-V compound semiconductor layer introduced with isoelectronic traps.
CONSTITUTION: A PN junction 2 is formed by using the crystal containing isoelectronic traps 1. Or a thin metal layer 3 such as of W, Au or the like is deposited to form a Schottky barrier 4. If with such constitution light 5 is radiated in the PN junction 2 or Schottky barrier 4, the absorption of photons by interband spacings takes place, forming electron-hole pairs 6. At the same time, the absorption of photons by the isoelectronic traps 1 also takes place, producing excitons 7. Hence, in the region where internal fields are strong such as in the space charge region of the PN junction 2 or the barrier 4, excitons 7 decompose to electrons 8 and holes 9, and the electrons 8 flow into the N type layer 10 and the holes 9 into the P type layer 11, generating photo current. This causes the external output to be increased by as much as the photons absorbed by the traps
COPYRIGHT: (C)1979,JPO&Japio
JP12695177A 1977-10-20 1977-10-20 Photo detector Pending JPS5459891A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12695177A JPS5459891A (en) 1977-10-20 1977-10-20 Photo detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12695177A JPS5459891A (en) 1977-10-20 1977-10-20 Photo detector

Publications (1)

Publication Number Publication Date
JPS5459891A true JPS5459891A (en) 1979-05-14

Family

ID=14947923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12695177A Pending JPS5459891A (en) 1977-10-20 1977-10-20 Photo detector

Country Status (1)

Country Link
JP (1) JPS5459891A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2015033706A1 (en) * 2013-09-04 2017-03-02 国立研究開発法人産業技術総合研究所 Semiconductor device, manufacturing method thereof, and semiconductor integrated circuit
WO2017169122A1 (en) * 2016-03-30 2017-10-05 ソニー株式会社 Photoelectric conversion element and photoelectric conversion device
WO2018088285A1 (en) * 2016-11-14 2018-05-17 ソニーセミコンダクタソリューションズ株式会社 Solid-state imaging apparatus, method for manufacturing same, and electronic device

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2015033706A1 (en) * 2013-09-04 2017-03-02 国立研究開発法人産業技術総合研究所 Semiconductor device, manufacturing method thereof, and semiconductor integrated circuit
US9711597B2 (en) 2013-09-04 2017-07-18 National Institute Of Advanced Industrial Science And Technology Semiconductor element, method for manufacturing same, and semiconductor integrated circuit
JP2017191947A (en) * 2013-09-04 2017-10-19 国立研究開発法人産業技術総合研究所 Semiconductor device and manufacturing method therefor, and semiconductor integrated circuit
WO2017169122A1 (en) * 2016-03-30 2017-10-05 ソニー株式会社 Photoelectric conversion element and photoelectric conversion device
KR20180125468A (en) * 2016-03-30 2018-11-23 소니 주식회사 Photoelectric conversion element and photoelectric conversion device
JPWO2017169122A1 (en) * 2016-03-30 2019-02-07 ソニー株式会社 Photoelectric conversion element and photoelectric conversion device
US10483306B2 (en) 2016-03-30 2019-11-19 Sony Corporation Photoelectric conversion element and photoelectric conversion device
TWI731035B (en) * 2016-03-30 2021-06-21 日商新力股份有限公司 Photoelectric conversion element and photoelectric conversion device
WO2018088285A1 (en) * 2016-11-14 2018-05-17 ソニーセミコンダクタソリューションズ株式会社 Solid-state imaging apparatus, method for manufacturing same, and electronic device
CN109937482A (en) * 2016-11-14 2019-06-25 索尼半导体解决方案公司 Solid state image pickup device, its manufacturing method and electronic device
US11398522B2 (en) 2016-11-14 2022-07-26 Sony Semiconductor Solutions Corporation Solid-state imaging device, manufacturing method thereof, and electronic device
US11830906B2 (en) 2016-11-14 2023-11-28 Sony Semiconductor Solutions Corporation Solid-state imaging device, manufacturing method thereof, and electronic device

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