JPS5595886A - Neutron detector - Google Patents

Neutron detector

Info

Publication number
JPS5595886A
JPS5595886A JP294179A JP294179A JPS5595886A JP S5595886 A JPS5595886 A JP S5595886A JP 294179 A JP294179 A JP 294179A JP 294179 A JP294179 A JP 294179A JP S5595886 A JPS5595886 A JP S5595886A
Authority
JP
Japan
Prior art keywords
substrate
layer
single crystal
silicon single
epitaxial layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP294179A
Other languages
Japanese (ja)
Inventor
Hitoshi Otake
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TDK Corp
Original Assignee
TDK Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP294179A priority Critical patent/JPS5595886A/en
Publication of JPS5595886A publication Critical patent/JPS5595886A/en
Pending legal-status Critical Current

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  • Measurement Of Radiation (AREA)

Abstract

PURPOSE: To obtain a low-noise and high-sensitivity neutron detector which is easy to realize the miniaturization of the overall structure and the converter part along with the high measurement accuracy and high resolution respectively, by forming the boron phosphide epitaxial layer onto the silicon single crystal of the substrate.
CONSTITUTION: Substrate 1 is produced with the silicon single crystal which generates the carrier when the radiation is put in used at least at the surface layer of the substrate. Then boron phosphide epitaxial layer 2 is grown via the vapor phase onto the surface of the silicon single crystal of substrate 1. In that case, the temperature of substrate 1 is set at 900W1100°C, and PH3 and B2H6 are used preferably for the volatile compound as the source. Also silicon epitaxial layer 3 can be provided onto layer 2 mentioned above. This layer 3 features the single crystal substantially with thickness of 1W50μ secured generally and then formed preferably into the surface lamination layer type, PIN type or PN-junction type respectively.
COPYRIGHT: (C)1980,JPO&Japio
JP294179A 1979-01-17 1979-01-17 Neutron detector Pending JPS5595886A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP294179A JPS5595886A (en) 1979-01-17 1979-01-17 Neutron detector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP294179A JPS5595886A (en) 1979-01-17 1979-01-17 Neutron detector

Publications (1)

Publication Number Publication Date
JPS5595886A true JPS5595886A (en) 1980-07-21

Family

ID=11543377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP294179A Pending JPS5595886A (en) 1979-01-17 1979-01-17 Neutron detector

Country Status (1)

Country Link
JP (1) JPS5595886A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01253683A (en) * 1988-03-31 1989-10-09 Matsushita Electric Ind Co Ltd Neutron detector and neutron detector array
JPH02242190A (en) * 1989-03-15 1990-09-26 Matsushita Electric Ind Co Ltd Semiconductor radiation sensor and sensor array
US5321269A (en) * 1990-04-24 1994-06-14 Hitachi, Ltd. Neutron individual dose meter, neutron dose rate meter, neutron detector and its method of manufacture
US5726453A (en) * 1996-09-30 1998-03-10 Westinghouse Electric Corporation Radiation resistant solid state neutron detector
US5880471A (en) * 1995-09-01 1999-03-09 Forschungszentrum Julich Neutron detector

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01253683A (en) * 1988-03-31 1989-10-09 Matsushita Electric Ind Co Ltd Neutron detector and neutron detector array
JPH02242190A (en) * 1989-03-15 1990-09-26 Matsushita Electric Ind Co Ltd Semiconductor radiation sensor and sensor array
US5321269A (en) * 1990-04-24 1994-06-14 Hitachi, Ltd. Neutron individual dose meter, neutron dose rate meter, neutron detector and its method of manufacture
USRE35908E (en) * 1990-04-24 1998-09-29 Hitachi, Ltd. Neutron individual dose meter neutron dose rate meter, neutron detector and its method of manufacture
US5880471A (en) * 1995-09-01 1999-03-09 Forschungszentrum Julich Neutron detector
US5726453A (en) * 1996-09-30 1998-03-10 Westinghouse Electric Corporation Radiation resistant solid state neutron detector

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