JPS57190390A - Semiconductor laser element - Google Patents
Semiconductor laser elementInfo
- Publication number
- JPS57190390A JPS57190390A JP7592581A JP7592581A JPS57190390A JP S57190390 A JPS57190390 A JP S57190390A JP 7592581 A JP7592581 A JP 7592581A JP 7592581 A JP7592581 A JP 7592581A JP S57190390 A JPS57190390 A JP S57190390A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- clad layer
- region
- inp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0421—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers
- H01S5/0422—Electrical excitation ; Circuits therefor characterised by the semiconducting contacting layers with n- and p-contacts on the same side of the active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/24—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a grooved structure, e.g. V-grooved, crescent active layer in groove, VSIS laser
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain the laser element with which a stabilized lateral mode oscillation can be performed by a method wherein, when a stripe-shaped active region is formed on a compound semiconductor substrate and a clad layer is coated on the above, a uniconductive type clad layer is formed on the active layer and the clad layer connected to the above is formed in reverse conductive type. CONSTITUTION:An insulating InP clad layer 11 and a P type clad layer 12 are formed and laminated on an N type InP substrate 10, and a striped V-shape groove 13 is provided in the center part of the above in such a manner that its point is entering the layer 11. Then, an N type InP GaAs active region 14 is formed in the groove 13 only, and an N type InP clad layer 15 is coated on the whole surface including the region 14. Subsequently, a mask 16 consisting of an SiO2 film is provided at the position, which does not overlap with the layer 14, on the surface of the layer 15, and Cd is diffused on the part, wherein region 14 is not contained, in the layer 15 and a P type region 17 is formed in such a manner that it is entering into the layer 11. Then, an N type electrode 19 and a P type electrode 20 are installed on the surface pinching the mask 16, and an element having an excellent dynamic characteristic can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7592581A JPS57190390A (en) | 1981-05-20 | 1981-05-20 | Semiconductor laser element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7592581A JPS57190390A (en) | 1981-05-20 | 1981-05-20 | Semiconductor laser element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57190390A true JPS57190390A (en) | 1982-11-22 |
Family
ID=13590353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7592581A Pending JPS57190390A (en) | 1981-05-20 | 1981-05-20 | Semiconductor laser element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57190390A (en) |
-
1981
- 1981-05-20 JP JP7592581A patent/JPS57190390A/en active Pending
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