JPS57187950A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS57187950A JPS57187950A JP7250181A JP7250181A JPS57187950A JP S57187950 A JPS57187950 A JP S57187950A JP 7250181 A JP7250181 A JP 7250181A JP 7250181 A JP7250181 A JP 7250181A JP S57187950 A JPS57187950 A JP S57187950A
- Authority
- JP
- Japan
- Prior art keywords
- region
- type
- insulation
- impurity
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To obtain information on various parameters of an insulation region that has not been obtained before, and to detect such deficiency as latch phenomenon of an IC, by forming a layer resistance monitor element of insulation separation region with impurity and insulation separation regions. CONSTITUTION:An N type buried-in impurity region 2 is formed on a P type semiconductor substrate 1. An insulation region 4 is formed on an epitaxial wafer where an epitaxial layer 3 is grown. A P type diffusion region 5 is formed. An N type impurity diffusion region 6 is formed to form an emitter of NPN transistor simultaneously. An aluminum electrode 8 is established after opening a necessary electrode window 7. A monitor element consists of the insulation region 4, N type impurity region and aluminum electrode 8. Another electrode is the P type substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7250181A JPS57187950A (en) | 1981-05-14 | 1981-05-14 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7250181A JPS57187950A (en) | 1981-05-14 | 1981-05-14 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57187950A true JPS57187950A (en) | 1982-11-18 |
Family
ID=13491142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7250181A Pending JPS57187950A (en) | 1981-05-14 | 1981-05-14 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57187950A (en) |
-
1981
- 1981-05-14 JP JP7250181A patent/JPS57187950A/en active Pending
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