JPS57187947A - Electrostatic chuck - Google Patents

Electrostatic chuck

Info

Publication number
JPS57187947A
JPS57187947A JP7168281A JP7168281A JPS57187947A JP S57187947 A JPS57187947 A JP S57187947A JP 7168281 A JP7168281 A JP 7168281A JP 7168281 A JP7168281 A JP 7168281A JP S57187947 A JPS57187947 A JP S57187947A
Authority
JP
Japan
Prior art keywords
type semiconductor
insulation film
semiconductor region
electrodes
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7168281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6258541B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7168281A priority Critical patent/JPS57187947A/ja
Publication of JPS57187947A publication Critical patent/JPS57187947A/ja
Publication of JPS6258541B2 publication Critical patent/JPS6258541B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Jigs For Machine Tools (AREA)
JP7168281A 1981-05-13 1981-05-13 Electrostatic chuck Granted JPS57187947A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7168281A JPS57187947A (en) 1981-05-13 1981-05-13 Electrostatic chuck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7168281A JPS57187947A (en) 1981-05-13 1981-05-13 Electrostatic chuck

Publications (2)

Publication Number Publication Date
JPS57187947A true JPS57187947A (en) 1982-11-18
JPS6258541B2 JPS6258541B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-07

Family

ID=13467573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7168281A Granted JPS57187947A (en) 1981-05-13 1981-05-13 Electrostatic chuck

Country Status (1)

Country Link
JP (1) JPS57187947A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950537A (ja) * 1982-09-17 1984-03-23 Hitachi Ltd ウエハチヤツク
JPS60130006U (ja) * 1984-02-08 1985-08-31 株式会社 平安鉄工所 座標読取機
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
WO2008051369A3 (en) * 2006-10-25 2008-07-31 Axcelis Tech Inc Low-cost electrostatic clamp with fast declamp time and the manufacture

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6431628B1 (ja) * 2018-02-22 2018-11-28 株式会社タカラトミー コマ玩具

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950537A (ja) * 1982-09-17 1984-03-23 Hitachi Ltd ウエハチヤツク
JPS60130006U (ja) * 1984-02-08 1985-08-31 株式会社 平安鉄工所 座標読取機
US5600530A (en) * 1992-08-04 1997-02-04 The Morgan Crucible Company Plc Electrostatic chuck
WO2008051369A3 (en) * 2006-10-25 2008-07-31 Axcelis Tech Inc Low-cost electrostatic clamp with fast declamp time and the manufacture

Also Published As

Publication number Publication date
JPS6258541B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1987-12-07

Similar Documents

Publication Publication Date Title
JPS5754370A (en) Insulating gate type transistor
JPS57187947A (en) Electrostatic chuck
JPS53142196A (en) Bipolar type semiconductor device
JPS55102268A (en) Protecting circuit for semiconductor device
JPS56103463A (en) Semiconductor device of high withstand voltage planar type
JPS5539636A (en) Composite semiconductor
JPS54111287A (en) Resin seal planar-structure semiconductor element
JPS55146967A (en) Semiconductor ic device
JPS54140881A (en) Semiconductor dvice
JPS5624971A (en) Manufacture of semiconductor device
JPS5670675A (en) Manufacture of photoelectric converter
JPS56104474A (en) Silicon semiconductor device
JPS5712579A (en) Buried type semiconductor laser
JPS5633852A (en) Manufacture of semiconductor device
JPS57202773A (en) Silicon integrated circuit device
JPS55130141A (en) Fabricating method of semiconductor device
JPS5636160A (en) Schottky barrier type semiconductor device
JPS57184250A (en) Field-effect type semiconductor circuit element
JPS566466A (en) Charge pumping type memory cell
JPS5525910A (en) Multiple cold emission cathode
JPS5670674A (en) Photoelectric converter
JPS5610968A (en) Semiconductor device
JPS56107585A (en) Semiconductor diode device
JPS56148876A (en) Manufacture of mis type photoelectric converter
JPS54161546A (en) Partially plating method