JPS57186753A - Photomask substrate - Google Patents

Photomask substrate

Info

Publication number
JPS57186753A
JPS57186753A JP7065681A JP7065681A JPS57186753A JP S57186753 A JPS57186753 A JP S57186753A JP 7065681 A JP7065681 A JP 7065681A JP 7065681 A JP7065681 A JP 7065681A JP S57186753 A JPS57186753 A JP S57186753A
Authority
JP
Japan
Prior art keywords
mark
mask
matching
mask matching
grid lines
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7065681A
Other languages
English (en)
Japanese (ja)
Other versions
JPS623943B2 (enrdf_load_stackoverflow
Inventor
Kenichi Kuroishi
Yoshihisa Furuya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP7065681A priority Critical patent/JPS57186753A/ja
Publication of JPS57186753A publication Critical patent/JPS57186753A/ja
Publication of JPS623943B2 publication Critical patent/JPS623943B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP7065681A 1981-05-13 1981-05-13 Photomask substrate Granted JPS57186753A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7065681A JPS57186753A (en) 1981-05-13 1981-05-13 Photomask substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7065681A JPS57186753A (en) 1981-05-13 1981-05-13 Photomask substrate

Publications (2)

Publication Number Publication Date
JPS57186753A true JPS57186753A (en) 1982-11-17
JPS623943B2 JPS623943B2 (enrdf_load_stackoverflow) 1987-01-28

Family

ID=13437910

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7065681A Granted JPS57186753A (en) 1981-05-13 1981-05-13 Photomask substrate

Country Status (1)

Country Link
JP (1) JPS57186753A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS623943B2 (enrdf_load_stackoverflow) 1987-01-28

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