JPS5718373A - Semiconductor photoreceiving element - Google Patents
Semiconductor photoreceiving elementInfo
- Publication number
- JPS5718373A JPS5718373A JP9302580A JP9302580A JPS5718373A JP S5718373 A JPS5718373 A JP S5718373A JP 9302580 A JP9302580 A JP 9302580A JP 9302580 A JP9302580 A JP 9302580A JP S5718373 A JPS5718373 A JP S5718373A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- inp
- type impurity
- same conductive
- photoreceiving element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 11
- 239000012535 impurity Substances 0.000 abstract 5
- 230000031700 light absorption Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000002344 surface layer Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/107—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes
- H01L31/1075—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier working in avalanche mode, e.g. avalanche photodiodes in which the active layers, e.g. absorption or multiplication layers, form an heterostructure, e.g. SAM structure
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To obtain an APD having excellent characteristics, e.g., high magnification factor, low dark current, etc. with a sensitivity for the light of 1.2-1.65mum of wavelength by forming specific buffer layer, light absorption layer, two-layer InP layer, photoreceiving element, etc. on a substrate. CONSTITUTION:The same conductive type impurity-containing InP buffer layer 21, an InGaAs light absorption layer 31, and an InP first layer 41 are formed on an InP substrate 2 containing N type or P type impurity. An InP second layer 41 containing the same conductive type impurity as the first layer 41 higher in density than the first layer 41 is formed thereon, and different conductive impurity high density photodetector 61 are formed on a part of the region. Further, the same conductive type impurity high density containing guard ring 43 is formed on a part of the surface layer of the second layer 41 around the photoreceiving element 61.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9302580A JPS5718373A (en) | 1980-07-08 | 1980-07-08 | Semiconductor photoreceiving element |
US06/281,304 US4442444A (en) | 1980-07-08 | 1981-07-08 | Avalanche photodiodes |
DE8181303108T DE3172668D1 (en) | 1980-07-08 | 1981-07-08 | Avalanche photodiodes |
EP81303108A EP0043734B1 (en) | 1980-07-08 | 1981-07-08 | Avalanche photodiodes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9302580A JPS5718373A (en) | 1980-07-08 | 1980-07-08 | Semiconductor photoreceiving element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5718373A true JPS5718373A (en) | 1982-01-30 |
JPS6146076B2 JPS6146076B2 (en) | 1986-10-11 |
Family
ID=14070941
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9302580A Granted JPS5718373A (en) | 1980-07-08 | 1980-07-08 | Semiconductor photoreceiving element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5718373A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60254674A (en) * | 1984-05-31 | 1985-12-16 | Fujitsu Ltd | Semiconductor photo receptor |
JPH02100379A (en) * | 1988-10-07 | 1990-04-12 | Hikari Keisoku Gijutsu Kaihatsu Kk | Photo-detector |
-
1980
- 1980-07-08 JP JP9302580A patent/JPS5718373A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60254674A (en) * | 1984-05-31 | 1985-12-16 | Fujitsu Ltd | Semiconductor photo receptor |
JPH02100379A (en) * | 1988-10-07 | 1990-04-12 | Hikari Keisoku Gijutsu Kaihatsu Kk | Photo-detector |
Also Published As
Publication number | Publication date |
---|---|
JPS6146076B2 (en) | 1986-10-11 |
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