JPS57169742A - Forming composition of relief image and forming method for relief image - Google Patents
Forming composition of relief image and forming method for relief imageInfo
- Publication number
- JPS57169742A JPS57169742A JP57045759A JP4575982A JPS57169742A JP S57169742 A JPS57169742 A JP S57169742A JP 57045759 A JP57045759 A JP 57045759A JP 4575982 A JP4575982 A JP 4575982A JP S57169742 A JPS57169742 A JP S57169742A
- Authority
- JP
- Japan
- Prior art keywords
- relief image
- indicator
- composition
- forming composition
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8109098 | 1981-03-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57169742A true JPS57169742A (en) | 1982-10-19 |
Family
ID=10520592
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57045759A Pending JPS57169742A (en) | 1981-03-24 | 1982-03-24 | Forming composition of relief image and forming method for relief image |
Country Status (11)
Country | Link |
---|---|
US (1) | US4578341A (ja) |
EP (1) | EP0061319B1 (ja) |
JP (1) | JPS57169742A (ja) |
AT (1) | ATE20502T1 (ja) |
AU (1) | AU549224B2 (ja) |
CA (1) | CA1177686A (ja) |
DE (1) | DE3271737D1 (ja) |
DK (1) | DK164676C (ja) |
ES (1) | ES8306267A1 (ja) |
PT (1) | PT74636B (ja) |
ZA (1) | ZA821588B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6381421A (ja) * | 1986-09-26 | 1988-04-12 | Matsushita Electric Ind Co Ltd | 感光性樹脂組成物 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4729935A (en) * | 1982-03-18 | 1988-03-08 | Hoechst Celanese Corporation | Process for the production of photographic images utilizing a negative working diazo contact film |
EP0151191A1 (de) * | 1984-01-25 | 1985-08-14 | American Hoechst Corporation | Lichtempfindliches Material zur Herstellung von Kopiervorlagen |
GB2167572A (en) * | 1984-11-23 | 1986-05-29 | Colin George Thompson | Photo mechanical imaging |
US4672021A (en) * | 1985-06-03 | 1987-06-09 | Fairmount Chemical Company | Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder |
US5462834A (en) * | 1986-05-29 | 1995-10-31 | Weller, Jr.; Edward L. | Water based varnish for production of colored images |
EP0468002A4 (en) * | 1989-12-15 | 1995-08-09 | Grace W R & Co | Autodeposition emulsion for selectively protecting metallic surfaces |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB341454A (en) * | 1929-07-15 | 1931-01-15 | Michele Luigi Martinez | Colour photography |
NL270834A (ja) * | 1960-10-31 | |||
NL292007A (ja) * | 1962-04-27 | |||
GB1052699A (ja) * | 1963-12-03 | |||
GB1143679A (ja) * | 1965-05-22 | 1900-01-01 | ||
DE1522496A1 (de) * | 1966-02-12 | 1969-09-11 | Kalle Ag | Lichtreprographische Kopiermasse und damit beschichtetes Kopiermaterial |
GB1386586A (en) * | 1970-12-30 | 1975-03-12 | Kodak Ltd | Preparation of resist images |
GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
GB1604652A (en) * | 1977-04-12 | 1981-12-16 | Vickers Ltd | Radiation sensitive materials |
US4311784A (en) * | 1978-05-09 | 1982-01-19 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive solvent-processable litho element |
JPS5935360B2 (ja) * | 1978-07-21 | 1984-08-28 | プロセス資材株式会社 | 記録材料 |
JPS56161537A (en) * | 1980-05-16 | 1981-12-11 | Kimoto & Co Ltd | Photosensitive material and its developing method |
US4448873A (en) * | 1982-03-18 | 1984-05-15 | American Hoechst Corporation | Negative working diazo contact film |
-
1982
- 1982-03-10 ZA ZA821588A patent/ZA821588B/xx unknown
- 1982-03-11 DK DK107882A patent/DK164676C/da active
- 1982-03-19 DE DE8282301423T patent/DE3271737D1/de not_active Expired
- 1982-03-19 EP EP82301423A patent/EP0061319B1/en not_active Expired
- 1982-03-19 AT AT82301423T patent/ATE20502T1/de not_active IP Right Cessation
- 1982-03-22 CA CA000398939A patent/CA1177686A/en not_active Expired
- 1982-03-23 ES ES510699A patent/ES8306267A1/es not_active Expired
- 1982-03-23 PT PT74636A patent/PT74636B/pt not_active IP Right Cessation
- 1982-03-24 AU AU81877/82A patent/AU549224B2/en not_active Ceased
- 1982-03-24 JP JP57045759A patent/JPS57169742A/ja active Pending
-
1984
- 1984-08-03 US US06/636,810 patent/US4578341A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6381421A (ja) * | 1986-09-26 | 1988-04-12 | Matsushita Electric Ind Co Ltd | 感光性樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
DK164676C (da) | 1992-12-21 |
EP0061319B1 (en) | 1986-06-18 |
AU549224B2 (en) | 1986-01-23 |
ES510699A0 (es) | 1983-05-01 |
PT74636A (en) | 1982-04-01 |
DE3271737D1 (en) | 1986-07-24 |
US4578341A (en) | 1986-03-25 |
EP0061319A1 (en) | 1982-09-29 |
AU8187782A (en) | 1982-09-30 |
ZA821588B (en) | 1983-02-23 |
DK164676B (da) | 1992-07-27 |
DK107882A (da) | 1982-09-25 |
CA1177686A (en) | 1984-11-13 |
ATE20502T1 (de) | 1986-07-15 |
PT74636B (en) | 1983-10-20 |
ES8306267A1 (es) | 1983-05-01 |
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