JPS57166506A - Strain measuring method - Google Patents

Strain measuring method

Info

Publication number
JPS57166506A
JPS57166506A JP56052840A JP5284081A JPS57166506A JP S57166506 A JPS57166506 A JP S57166506A JP 56052840 A JP56052840 A JP 56052840A JP 5284081 A JP5284081 A JP 5284081A JP S57166506 A JPS57166506 A JP S57166506A
Authority
JP
Japan
Prior art keywords
strain
pattern
lines
sample
found
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56052840A
Other languages
Japanese (ja)
Inventor
Hitomi Ito
Hirokazu Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP56052840A priority Critical patent/JPS57166506A/en
Publication of JPS57166506A publication Critical patent/JPS57166506A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/06—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring the deformation in a solid

Abstract

PURPOSE:To measure strain precisely and quantitatively by utilizing correlation between the number of electron channeling patterns and the strain. CONSTITUTION:In general, when an angle of incidence is varied while an electron beam is caused by a scanning electron microscope to strike a crystalline conductive material, such as a metallic material, at one point, an electron channeling pattern appears. This pattern loses contrast when a sample is distorted, so a sample free of strain by sufficient annealing and another sample having prescribed strain are used and the number of pattern lines crossing a prescribed circle drawn on a pattern image is counted. Then, correlation between the number of the lines and the strain is found. This relation is linear, so that the extent of strain is found from said number of lines.
JP56052840A 1981-04-08 1981-04-08 Strain measuring method Pending JPS57166506A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56052840A JPS57166506A (en) 1981-04-08 1981-04-08 Strain measuring method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56052840A JPS57166506A (en) 1981-04-08 1981-04-08 Strain measuring method

Publications (1)

Publication Number Publication Date
JPS57166506A true JPS57166506A (en) 1982-10-14

Family

ID=12926038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56052840A Pending JPS57166506A (en) 1981-04-08 1981-04-08 Strain measuring method

Country Status (1)

Country Link
JP (1) JPS57166506A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01182726A (en) * 1988-01-14 1989-07-20 Nippon Steel Corp Evaluation of crystal strain and apparatus therefor
JPH02118438A (en) * 1988-10-28 1990-05-02 Mitsubishi Heavy Ind Ltd Method for evaluating fatigue damage of metallic material
EP0599582A2 (en) * 1992-11-20 1994-06-01 Topometrix Scanning apparatus linearization and calibration system
CN106568402A (en) * 2016-11-16 2017-04-19 上海大学 Method of testing depth of tiny hole

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01182726A (en) * 1988-01-14 1989-07-20 Nippon Steel Corp Evaluation of crystal strain and apparatus therefor
JPH02118438A (en) * 1988-10-28 1990-05-02 Mitsubishi Heavy Ind Ltd Method for evaluating fatigue damage of metallic material
EP0599582A2 (en) * 1992-11-20 1994-06-01 Topometrix Scanning apparatus linearization and calibration system
EP0599582A3 (en) * 1992-11-20 1995-05-10 Topometrix Scanning apparatus linearization and calibration system.
CN106568402A (en) * 2016-11-16 2017-04-19 上海大学 Method of testing depth of tiny hole

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