JPS5654041A - Electron beam exposure device - Google Patents

Abstract

PURPOSE:To conduct positioning accurately by a method wherein a sample base is moved by false pulses while electron beams are relatively deflected, an irradiating location is fixed and scanned, and the number of false pulses at a point of time when a mark is detected is obtained. CONSTITUTION:False pulses 17 are supplied to an X direction deflector 16 through an OR circuit 15 while being fed to an A/D converter 19. The deflector 16 independently deflects the pulses in the X direction. Thus, electron beams 11 are scanned in the X direction from an irradiating location relatively positioned to a material 13 to be exposed according to measuring pulses. When the beams 11 cross a mark 13a of the sample 13 by means of deflection, reflected electrons are generated, and the electrons are detected 18 and A/D converted 19. The false pulses are used as extracting clock, digital signals corresponding to the number of clock up to the rise and fall of detecting signals are emitted, and the signals are arithmetically processed 20. Thus, a mark location of the sample 13 is calculated, and the location is put out as positioning information. The same applies in the Y direction, and positioning can accurately be conducted.