JPS57162345A - Manufacture of insulation isolating substrate - Google Patents
Manufacture of insulation isolating substrateInfo
- Publication number
- JPS57162345A JPS57162345A JP56046770A JP4677081A JPS57162345A JP S57162345 A JPS57162345 A JP S57162345A JP 56046770 A JP56046770 A JP 56046770A JP 4677081 A JP4677081 A JP 4677081A JP S57162345 A JPS57162345 A JP S57162345A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- polycrystalline
- shaped grooves
- single crystal
- rear surfaces
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W10/011—
-
- H10W10/10—
Landscapes
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56046770A JPS57162345A (en) | 1981-03-30 | 1981-03-30 | Manufacture of insulation isolating substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56046770A JPS57162345A (en) | 1981-03-30 | 1981-03-30 | Manufacture of insulation isolating substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57162345A true JPS57162345A (en) | 1982-10-06 |
| JPS6152983B2 JPS6152983B2 (en:Method) | 1986-11-15 |
Family
ID=12756557
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56046770A Granted JPS57162345A (en) | 1981-03-30 | 1981-03-30 | Manufacture of insulation isolating substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57162345A (en:Method) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0722629A (ja) * | 1991-06-25 | 1995-01-24 | Mitsubishi Materials Shilicon Corp | 半導体装置の製造方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63140041U (en:Method) * | 1987-03-07 | 1988-09-14 |
-
1981
- 1981-03-30 JP JP56046770A patent/JPS57162345A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0722629A (ja) * | 1991-06-25 | 1995-01-24 | Mitsubishi Materials Shilicon Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6152983B2 (en:Method) | 1986-11-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5474682A (en) | Semiconductor and its manufacture | |
| JPS57167655A (en) | Manufacture of insulating isolation substrate | |
| JPS57162345A (en) | Manufacture of insulation isolating substrate | |
| JPS575328A (en) | Growing method for semiconductor crystal | |
| JPS57162346A (en) | Manufacutre of insulating and isolating substrate | |
| JPS56161677A (en) | Forming method for diaphragm | |
| JPS57204146A (en) | Manufacture of semiconductor device | |
| JPS57211737A (en) | Manufacture of semiconductor substrate | |
| JPS5763842A (en) | Preparation of semiconductor integrated circuit | |
| JPS5336182A (en) | Thin semiconductor single crystal film forming insulation substrate | |
| JPS5455181A (en) | Production of semiconductor substrate | |
| JPS5419681A (en) | Dielectric isolating substrate and production of the same | |
| JPS5357774A (en) | Dielectric insulated and isolated substrate and its production | |
| JPS5687339A (en) | Manufacture of semiconductor device | |
| JPS5637663A (en) | Capacitor | |
| JPS57196544A (en) | Manufacture of integrated circuit isolated by oxide film | |
| JPS5322382A (en) | Production of dielectric isolating substrate | |
| JPS52127166A (en) | Manufacture of semiconductor | |
| JPS5776865A (en) | Manufacture of semiconductor device | |
| JPS5399881A (en) | Manufacture of dielectric separation substrate | |
| JPS57143842A (en) | Manufacture of semiconductor device | |
| JPS5558543A (en) | Semiconductor device | |
| JPS6439745A (en) | Manufacture of semiconductor substrate for integrated circuit device | |
| JPS6475997A (en) | Focusing mirror and its manufacture | |
| JPS5710225A (en) | Forming method for silicon single crystalline film |