JPS57161856A - Photomask - Google Patents

Photomask

Info

Publication number
JPS57161856A
JPS57161856A JP4792281A JP4792281A JPS57161856A JP S57161856 A JPS57161856 A JP S57161856A JP 4792281 A JP4792281 A JP 4792281A JP 4792281 A JP4792281 A JP 4792281A JP S57161856 A JPS57161856 A JP S57161856A
Authority
JP
Japan
Prior art keywords
layer
tantalum
photomask
thin
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4792281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6251460B2 (enrdf_load_stackoverflow
Inventor
Akira Kaneki
Yuji Kikuchi
Yoji Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP4792281A priority Critical patent/JPS57161856A/ja
Priority to EP81109440A priority patent/EP0054736B1/en
Priority to DE8181109440T priority patent/DE3170637D1/de
Priority to US06/319,962 priority patent/US4374912A/en
Publication of JPS57161856A publication Critical patent/JPS57161856A/ja
Publication of JPS6251460B2 publication Critical patent/JPS6251460B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP4792281A 1980-12-22 1981-03-31 Photomask Granted JPS57161856A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP4792281A JPS57161856A (en) 1981-03-31 1981-03-31 Photomask
EP81109440A EP0054736B1 (en) 1980-12-22 1981-10-30 Photomask and photomask blank
DE8181109440T DE3170637D1 (en) 1980-12-22 1981-10-30 Photomask and photomask blank
US06/319,962 US4374912A (en) 1981-03-31 1981-11-10 Photomask and photomask blank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4792281A JPS57161856A (en) 1981-03-31 1981-03-31 Photomask

Publications (2)

Publication Number Publication Date
JPS57161856A true JPS57161856A (en) 1982-10-05
JPS6251460B2 JPS6251460B2 (enrdf_load_stackoverflow) 1987-10-30

Family

ID=12788853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4792281A Granted JPS57161856A (en) 1980-12-22 1981-03-31 Photomask

Country Status (1)

Country Link
JP (1) JPS57161856A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033555A (ja) * 1983-08-04 1985-02-20 Konishiroku Photo Ind Co Ltd ドライエッチング用マスク素材
JPS6280656A (ja) * 1985-10-04 1987-04-14 Toppan Printing Co Ltd フオトマスクブランクおよびフオトマスク
JPH05181259A (ja) * 1991-09-05 1993-07-23 Mitsubishi Electric Corp フォトマスクおよびその製造方法
JP2011059502A (ja) * 2009-09-11 2011-03-24 Hoya Corp フォトマスクブランクおよびフォトマスクの製造方法
JP2013068934A (ja) * 2011-09-07 2013-04-18 Hoya Corp マスクブランク、転写用マスク、および半導体デバイスの製造方法
WO2023120026A1 (ja) * 2021-12-23 2023-06-29 Hoya株式会社 マスクブランク、転写用マスクの製造方法、および半導体デバイスの製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033555A (ja) * 1983-08-04 1985-02-20 Konishiroku Photo Ind Co Ltd ドライエッチング用マスク素材
JPS6280656A (ja) * 1985-10-04 1987-04-14 Toppan Printing Co Ltd フオトマスクブランクおよびフオトマスク
JPH05181259A (ja) * 1991-09-05 1993-07-23 Mitsubishi Electric Corp フォトマスクおよびその製造方法
JP2011059502A (ja) * 2009-09-11 2011-03-24 Hoya Corp フォトマスクブランクおよびフォトマスクの製造方法
JP2013068934A (ja) * 2011-09-07 2013-04-18 Hoya Corp マスクブランク、転写用マスク、および半導体デバイスの製造方法
WO2023120026A1 (ja) * 2021-12-23 2023-06-29 Hoya株式会社 マスクブランク、転写用マスクの製造方法、および半導体デバイスの製造方法

Also Published As

Publication number Publication date
JPS6251460B2 (enrdf_load_stackoverflow) 1987-10-30

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