JPS57210676A - Substrate for electrode - Google Patents

Substrate for electrode

Info

Publication number
JPS57210676A
JPS57210676A JP56095197A JP9519781A JPS57210676A JP S57210676 A JPS57210676 A JP S57210676A JP 56095197 A JP56095197 A JP 56095197A JP 9519781 A JP9519781 A JP 9519781A JP S57210676 A JPS57210676 A JP S57210676A
Authority
JP
Japan
Prior art keywords
substrate
electrode
film
transparent
low reflecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56095197A
Other languages
Japanese (ja)
Other versions
JPS6257267B2 (en
Inventor
Noriyuki Hattori
Hisao Kawai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Hoya Electronics Corp
Original Assignee
Hoya Corp
Hoya Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Corp filed Critical Hoya Corp
Priority to JP56095197A priority Critical patent/JPS57210676A/en
Publication of JPS57210676A publication Critical patent/JPS57210676A/en
Publication of JPS6257267B2 publication Critical patent/JPS6257267B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PURPOSE:To obtain a substrate for a high transmission electrode in a simple structure by leaching both side surfaces of a glass plate to form low reflecting layers, and forming transparent electrode film on the low reflecting layer of one side, thereby reducing reflecting loss of incident light. CONSTITUTION:Both side surfaces of a glass 15 capable of leaching are leached, thereby forming low reflecting layers 16, 16' of 2-3mum of thickness. Then, an ITO (indium-tin oxide) film of transparent electrode material is accumulated by an ordinary vacuum deposition method in a thickness of approx. 300Angstrom . A sintered oxidized indium containing 5wt% of oxidized tin is used as a material to be deposited. Since the light reflection in the boundary between the transparent substrate and the air or between the light transmission substrate and the transparent conductive film can be reduced in this manner, the substrate for the electrode of high transmission coefficient can be obtained. This can be utilized for a solar battery, an electroluminescent display unit or the like.
JP56095197A 1981-06-22 1981-06-22 Substrate for electrode Granted JPS57210676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56095197A JPS57210676A (en) 1981-06-22 1981-06-22 Substrate for electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56095197A JPS57210676A (en) 1981-06-22 1981-06-22 Substrate for electrode

Publications (2)

Publication Number Publication Date
JPS57210676A true JPS57210676A (en) 1982-12-24
JPS6257267B2 JPS6257267B2 (en) 1987-11-30

Family

ID=14131021

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56095197A Granted JPS57210676A (en) 1981-06-22 1981-06-22 Substrate for electrode

Country Status (1)

Country Link
JP (1) JPS57210676A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01236661A (en) * 1988-03-17 1989-09-21 Nippon Sheet Glass Co Ltd Manufacture of thin film solar cell
WO2011006829A1 (en) * 2009-07-17 2011-01-20 Saint-Gobain Glass France Method for producing a coated and reflection-reducing pane

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01236661A (en) * 1988-03-17 1989-09-21 Nippon Sheet Glass Co Ltd Manufacture of thin film solar cell
WO2011006829A1 (en) * 2009-07-17 2011-01-20 Saint-Gobain Glass France Method for producing a coated and reflection-reducing pane

Also Published As

Publication number Publication date
JPS6257267B2 (en) 1987-11-30

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