JPS57160907A - Manufacture of amorphous silicon containing fluorine - Google Patents

Manufacture of amorphous silicon containing fluorine

Info

Publication number
JPS57160907A
JPS57160907A JP56043172A JP4317281A JPS57160907A JP S57160907 A JPS57160907 A JP S57160907A JP 56043172 A JP56043172 A JP 56043172A JP 4317281 A JP4317281 A JP 4317281A JP S57160907 A JPS57160907 A JP S57160907A
Authority
JP
Japan
Prior art keywords
gaseous
film
silicon
contg
fluorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56043172A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159208B2 (enrdf_load_stackoverflow
Inventor
Yutaka Hayashi
Mitsuyuki Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP56043172A priority Critical patent/JPS57160907A/ja
Publication of JPS57160907A publication Critical patent/JPS57160907A/ja
Publication of JPH0159208B2 publication Critical patent/JPH0159208B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Recrystallisation Techniques (AREA)
  • Silicon Compounds (AREA)
JP56043172A 1981-03-26 1981-03-26 Manufacture of amorphous silicon containing fluorine Granted JPS57160907A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56043172A JPS57160907A (en) 1981-03-26 1981-03-26 Manufacture of amorphous silicon containing fluorine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56043172A JPS57160907A (en) 1981-03-26 1981-03-26 Manufacture of amorphous silicon containing fluorine

Publications (2)

Publication Number Publication Date
JPS57160907A true JPS57160907A (en) 1982-10-04
JPH0159208B2 JPH0159208B2 (enrdf_load_stackoverflow) 1989-12-15

Family

ID=12656457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56043172A Granted JPS57160907A (en) 1981-03-26 1981-03-26 Manufacture of amorphous silicon containing fluorine

Country Status (1)

Country Link
JP (1) JPS57160907A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020178067A (ja) * 2019-04-19 2020-10-29 日新電機株式会社 シリコン膜の成膜方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01105912U (enrdf_load_stackoverflow) * 1988-01-07 1989-07-17
JPH01105911U (enrdf_load_stackoverflow) * 1988-01-07 1989-07-17

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020178067A (ja) * 2019-04-19 2020-10-29 日新電機株式会社 シリコン膜の成膜方法

Also Published As

Publication number Publication date
JPH0159208B2 (enrdf_load_stackoverflow) 1989-12-15

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