JPS5715423A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS5715423A
JPS5715423A JP8948680A JP8948680A JPS5715423A JP S5715423 A JPS5715423 A JP S5715423A JP 8948680 A JP8948680 A JP 8948680A JP 8948680 A JP8948680 A JP 8948680A JP S5715423 A JPS5715423 A JP S5715423A
Authority
JP
Japan
Prior art keywords
mask
film
psg
liquid glass
sio2
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8948680A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0119255B2 (enrdf_load_stackoverflow
Inventor
Shuji Tabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8948680A priority Critical patent/JPS5715423A/ja
Publication of JPS5715423A publication Critical patent/JPS5715423A/ja
Publication of JPH0119255B2 publication Critical patent/JPH0119255B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP8948680A 1980-07-01 1980-07-01 Manufacture of semiconductor device Granted JPS5715423A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8948680A JPS5715423A (en) 1980-07-01 1980-07-01 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8948680A JPS5715423A (en) 1980-07-01 1980-07-01 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5715423A true JPS5715423A (en) 1982-01-26
JPH0119255B2 JPH0119255B2 (enrdf_load_stackoverflow) 1989-04-11

Family

ID=13972064

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8948680A Granted JPS5715423A (en) 1980-07-01 1980-07-01 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5715423A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158928A (ja) * 1982-03-17 1983-09-21 Agency Of Ind Science & Technol 絶縁基板上半導体装置の製造方法
JPS6034020A (ja) * 1983-08-04 1985-02-21 Fujitsu Ltd 半導体装置の製造方法
JPS62276538A (ja) * 1986-05-23 1987-12-01 Konica Corp ハロゲン化銀写真感光材料

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4997571A (enrdf_load_stackoverflow) * 1973-01-17 1974-09-14
JPS5158071A (ja) * 1974-11-18 1976-05-21 Nichiden Varian Kk Supatsutaetsuchinguho
JPS5162673A (en) * 1974-11-27 1976-05-31 Fujitsu Ltd Handotaisochino seizohoho

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4997571A (enrdf_load_stackoverflow) * 1973-01-17 1974-09-14
JPS5158071A (ja) * 1974-11-18 1976-05-21 Nichiden Varian Kk Supatsutaetsuchinguho
JPS5162673A (en) * 1974-11-27 1976-05-31 Fujitsu Ltd Handotaisochino seizohoho

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158928A (ja) * 1982-03-17 1983-09-21 Agency Of Ind Science & Technol 絶縁基板上半導体装置の製造方法
JPS6034020A (ja) * 1983-08-04 1985-02-21 Fujitsu Ltd 半導体装置の製造方法
JPS62276538A (ja) * 1986-05-23 1987-12-01 Konica Corp ハロゲン化銀写真感光材料

Also Published As

Publication number Publication date
JPH0119255B2 (enrdf_load_stackoverflow) 1989-04-11

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