JPS5713768A - Insulated gate type field effect transistor - Google Patents
Insulated gate type field effect transistorInfo
- Publication number
- JPS5713768A JPS5713768A JP8776580A JP8776580A JPS5713768A JP S5713768 A JPS5713768 A JP S5713768A JP 8776580 A JP8776580 A JP 8776580A JP 8776580 A JP8776580 A JP 8776580A JP S5713768 A JPS5713768 A JP S5713768A
- Authority
- JP
- Japan
- Prior art keywords
- drain
- insulating film
- electrode
- sides
- field effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005669 field effect Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To improve the rise of unsaturated type characteristics of an IGFET by forming an electrode connected to a source or drain electrode at least one of the sides of the gate insulating film of the IGFET. CONSTITUTION:A conductive layer 6 is formed at least one (the drain side of this case) of the sides of a gate insulating film 4 (gate electrode 5) formed on a semiconductor substrate having a source region 3 and a drain region 2, and is connected to the drain electrode. Since the potential of the sides of the insulating film 4 of the drain region side is maintained equal to the drain potential in this manner, the rise of the drain current of the unsaturated type characteristics is presented at the low drain voltage side, and the FET can be operated with low power source.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8776580A JPS5713768A (en) | 1980-06-30 | 1980-06-30 | Insulated gate type field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8776580A JPS5713768A (en) | 1980-06-30 | 1980-06-30 | Insulated gate type field effect transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5713768A true JPS5713768A (en) | 1982-01-23 |
Family
ID=13924050
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8776580A Pending JPS5713768A (en) | 1980-06-30 | 1980-06-30 | Insulated gate type field effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5713768A (en) |
-
1980
- 1980-06-30 JP JP8776580A patent/JPS5713768A/en active Pending
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