KR0120542B1 - Semiconductor device and method thereof - Google Patents
Semiconductor device and method thereofInfo
- Publication number
- KR0120542B1 KR0120542B1 KR93018130A KR930018130A KR0120542B1 KR 0120542 B1 KR0120542 B1 KR 0120542B1 KR 93018130 A KR93018130 A KR 93018130A KR 930018130 A KR930018130 A KR 930018130A KR 0120542 B1 KR0120542 B1 KR 0120542B1
- Authority
- KR
- South Korea
- Prior art keywords
- conductive layer
- semiconductor device
- shaped groove
- insulator
- channel region
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 239000012212 insulator Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78642—Vertical transistors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/903—FET configuration adapted for use as static memory cell
Abstract
A semiconductor device and method thereof having small physical structure is provided to improve the electrical properties. The semiconductor device comprises: a first insulator(2) having U-shaped groove formed on a semiconductor substrate(1); a first conductive layer(3) used as a gate electrode formed on the U-shaped groove; a second insulator(4) used as a gate insulator formed on the first conductive layer(3); a second conductive layer(5) of T-shaped structure filled with the U-shaped groove; a channel region formed in the second conductive layer(5); and a source/drain regions formed at both sides of the channel region. Thereby, it is possible to reduce leakage current of transistor and achieve high ON current by increasing channel width.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR93018130A KR0120542B1 (en) | 1993-09-09 | 1993-09-09 | Semiconductor device and method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR93018130A KR0120542B1 (en) | 1993-09-09 | 1993-09-09 | Semiconductor device and method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
KR950010096A KR950010096A (en) | 1995-04-26 |
KR0120542B1 true KR0120542B1 (en) | 1997-10-27 |
Family
ID=19363231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR93018130A KR0120542B1 (en) | 1993-09-09 | 1993-09-09 | Semiconductor device and method thereof |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0120542B1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6737790B2 (en) * | 1998-05-19 | 2004-05-18 | Canon Kabushiki Kaisha | Image forming apparatus having a heat insulating member |
CN112951830B (en) * | 2021-02-01 | 2023-02-07 | 泉芯集成电路制造(济南)有限公司 | Integrated circuit device, memory, and electronic apparatus |
-
1993
- 1993-09-09 KR KR93018130A patent/KR0120542B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR950010096A (en) | 1995-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20060728 Year of fee payment: 10 |
|
LAPS | Lapse due to unpaid annual fee |