JPS57136150A - Method for measuring deviation angle of cut plane of single crystal - Google Patents

Method for measuring deviation angle of cut plane of single crystal

Info

Publication number
JPS57136150A
JPS57136150A JP2328681A JP2328681A JPS57136150A JP S57136150 A JPS57136150 A JP S57136150A JP 2328681 A JP2328681 A JP 2328681A JP 2328681 A JP2328681 A JP 2328681A JP S57136150 A JPS57136150 A JP S57136150A
Authority
JP
Japan
Prior art keywords
ray
angle
omega
plane
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2328681A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0358058B2 (enrdf_load_stackoverflow
Inventor
Tetsuo Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIGAKU DENKI KK
Rigaku Denki Co Ltd
Original Assignee
RIGAKU DENKI KK
Rigaku Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIGAKU DENKI KK, Rigaku Denki Co Ltd filed Critical RIGAKU DENKI KK
Priority to JP2328681A priority Critical patent/JPS57136150A/ja
Publication of JPS57136150A publication Critical patent/JPS57136150A/ja
Publication of JPH0358058B2 publication Critical patent/JPH0358058B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2328681A 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal Granted JPS57136150A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2328681A JPS57136150A (en) 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2328681A JPS57136150A (en) 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal

Publications (2)

Publication Number Publication Date
JPS57136150A true JPS57136150A (en) 1982-08-23
JPH0358058B2 JPH0358058B2 (enrdf_load_stackoverflow) 1991-09-04

Family

ID=12106356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2328681A Granted JPS57136150A (en) 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal

Country Status (1)

Country Link
JP (1) JPS57136150A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004045145B4 (de) * 2003-10-14 2006-07-06 Rigaku Corp., Akishima Verfahren zur Kristallorientierungsmessung mittels Röntgenstrahlung und Vorrichtung zur Kristallorientierungsmessung mittels Röntgenstrahlung
US7285168B2 (en) 2004-08-10 2007-10-23 Efg Elektrotechnische Fabrikations-Und Grosshandelsgesellschaft Mnb Method and apparatus for the measurement, orientation and fixation of at least one single crystal
CN105092583A (zh) * 2015-08-13 2015-11-25 中国振华集团永光电子有限公司（国营第八七三厂） 一种使用普通光源的硅单晶晶向偏离测试装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ELECTRONICS *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004045145B4 (de) * 2003-10-14 2006-07-06 Rigaku Corp., Akishima Verfahren zur Kristallorientierungsmessung mittels Röntgenstrahlung und Vorrichtung zur Kristallorientierungsmessung mittels Röntgenstrahlung
US7158609B2 (en) 2003-10-14 2007-01-02 Rigaku Corporation X-ray crystal orientation measuring method and X-ray crystal orientation measuring apparatus
US7285168B2 (en) 2004-08-10 2007-10-23 Efg Elektrotechnische Fabrikations-Und Grosshandelsgesellschaft Mnb Method and apparatus for the measurement, orientation and fixation of at least one single crystal
CN105092583A (zh) * 2015-08-13 2015-11-25 中国振华集团永光电子有限公司（国营第八七三厂） 一种使用普通光源的硅单晶晶向偏离测试装置

Also Published As

Publication number Publication date
JPH0358058B2 (enrdf_load_stackoverflow) 1991-09-04

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