JPS57136151A - Method for measuring deviation angle of cut plane of single crystal - Google Patents

Method for measuring deviation angle of cut plane of single crystal

Info

Publication number
JPS57136151A
JPS57136151A JP2328781A JP2328781A JPS57136151A JP S57136151 A JPS57136151 A JP S57136151A JP 2328781 A JP2328781 A JP 2328781A JP 2328781 A JP2328781 A JP 2328781A JP S57136151 A JPS57136151 A JP S57136151A
Authority
JP
Japan
Prior art keywords
rotary
crystal
omega
axis
angle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2328781A
Other languages
Japanese (ja)
Other versions
JPH0459581B2 (en
Inventor
Tetsuo Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIGAKU DENKI KK
Rigaku Denki Co Ltd
Original Assignee
RIGAKU DENKI KK
Rigaku Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIGAKU DENKI KK, Rigaku Denki Co Ltd filed Critical RIGAKU DENKI KK
Priority to JP2328781A priority Critical patent/JPS57136151A/en
Publication of JPS57136151A publication Critical patent/JPS57136151A/en
Publication of JPH0459581B2 publication Critical patent/JPH0459581B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To measure the deviation angle accurately, by measuring the rotary angle at which the intensity of a diffracted X ray becomes maximum by a rotary means which can rotate the crystal, with the normal line of the cut surface as an axis. CONSTITUTION:The crystal 1 is supported by a rotary holder 10 which can be rotated with respect to an L block 9. An omega rotary mechanism comprising the L block 9, a shaft 8, a wheel 7, a worm 6, and an omega motor rotates the surface of the crystal 1 on a Z axis. The rotary axis (omega axis) of the crystal is provided at a right angle with the incident direction of the X ray. The rotary angle (omega) of the X ray which is diffracted by the lattice plane of the sample crystal 1 is observed by the rotation on said omega axis. By calculating a plurality of data obtained by the measurement of the rotary angle, the deviation angle can be obtained efficiently and highly accurately.
JP2328781A 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal Granted JPS57136151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2328781A JPS57136151A (en) 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2328781A JPS57136151A (en) 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal

Publications (2)

Publication Number Publication Date
JPS57136151A true JPS57136151A (en) 1982-08-23
JPH0459581B2 JPH0459581B2 (en) 1992-09-22

Family

ID=12106384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2328781A Granted JPS57136151A (en) 1981-02-18 1981-02-18 Method for measuring deviation angle of cut plane of single crystal

Country Status (1)

Country Link
JP (1) JPS57136151A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0239260A2 (en) * 1986-03-26 1987-09-30 Stephen Howe Grading orientation errors in crystal specimens
DE102004045145B4 (en) * 2003-10-14 2006-07-06 Rigaku Corp., Akishima Method for crystal orientation measurement by means of X-ray radiation and apparatus for crystal orientation measurement by means of X-radiation
CN103257150A (en) * 2012-08-31 2013-08-21 云南北方驰宏光电有限公司 Crystal direction finder for directly measuring deflecting angle in crystal orientation and measurement method thereof
JP2016505816A (en) * 2012-11-16 2016-02-25 コリア リサーチ インスティチュート オブ スタンダーズ アンド サイエンス Surface orientation measurement method of single crystal wafer using high resolution X-ray rocking curve measurement

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ELETRONICS *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0239260A2 (en) * 1986-03-26 1987-09-30 Stephen Howe Grading orientation errors in crystal specimens
DE102004045145B4 (en) * 2003-10-14 2006-07-06 Rigaku Corp., Akishima Method for crystal orientation measurement by means of X-ray radiation and apparatus for crystal orientation measurement by means of X-radiation
US7158609B2 (en) 2003-10-14 2007-01-02 Rigaku Corporation X-ray crystal orientation measuring method and X-ray crystal orientation measuring apparatus
CN103257150A (en) * 2012-08-31 2013-08-21 云南北方驰宏光电有限公司 Crystal direction finder for directly measuring deflecting angle in crystal orientation and measurement method thereof
JP2016505816A (en) * 2012-11-16 2016-02-25 コリア リサーチ インスティチュート オブ スタンダーズ アンド サイエンス Surface orientation measurement method of single crystal wafer using high resolution X-ray rocking curve measurement
US9678023B2 (en) 2012-11-16 2017-06-13 Korea Research Institute Of Standards And Science Method of determining surface orientation of single crystal wafer

Also Published As

Publication number Publication date
JPH0459581B2 (en) 1992-09-22

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