JPS57134946A - Carrying device for semiconductor substrate - Google Patents
Carrying device for semiconductor substrateInfo
- Publication number
- JPS57134946A JPS57134946A JP2008181A JP2008181A JPS57134946A JP S57134946 A JPS57134946 A JP S57134946A JP 2008181 A JP2008181 A JP 2008181A JP 2008181 A JP2008181 A JP 2008181A JP S57134946 A JPS57134946 A JP S57134946A
- Authority
- JP
- Japan
- Prior art keywords
- carrying device
- wafer
- door
- transit
- sealed vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67173—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers in-line arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67727—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008181A JPS57134946A (en) | 1981-02-16 | 1981-02-16 | Carrying device for semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008181A JPS57134946A (en) | 1981-02-16 | 1981-02-16 | Carrying device for semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57134946A true JPS57134946A (en) | 1982-08-20 |
Family
ID=12017141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008181A Pending JPS57134946A (en) | 1981-02-16 | 1981-02-16 | Carrying device for semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57134946A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60115216A (ja) * | 1983-11-28 | 1985-06-21 | Hitachi Ltd | 真空処理方法及び装置 |
JPS63229836A (ja) * | 1987-03-19 | 1988-09-26 | Nikon Corp | ウエハ検査装置 |
JPH02184333A (ja) * | 1989-01-12 | 1990-07-18 | Tokyo Electron Ltd | ロードロック装置を備えた処理装置 |
JPH03184331A (ja) * | 1989-12-13 | 1991-08-12 | Hitachi Ltd | 複数真空処理装置 |
JPH04137613A (ja) * | 1990-09-28 | 1992-05-12 | Handotai Process Kenkyusho:Kk | 半導体装置の製造装置 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5487477A (en) * | 1977-12-23 | 1979-07-11 | Kokusai Electric Co Ltd | Device for etching and stripping semiconductor wafer |
JPS564244A (en) * | 1979-06-25 | 1981-01-17 | Hitachi Ltd | Continuous vacuum treatment device for wafer |
-
1981
- 1981-02-16 JP JP2008181A patent/JPS57134946A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5487477A (en) * | 1977-12-23 | 1979-07-11 | Kokusai Electric Co Ltd | Device for etching and stripping semiconductor wafer |
JPS564244A (en) * | 1979-06-25 | 1981-01-17 | Hitachi Ltd | Continuous vacuum treatment device for wafer |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60115216A (ja) * | 1983-11-28 | 1985-06-21 | Hitachi Ltd | 真空処理方法及び装置 |
JPS63229836A (ja) * | 1987-03-19 | 1988-09-26 | Nikon Corp | ウエハ検査装置 |
JPH02184333A (ja) * | 1989-01-12 | 1990-07-18 | Tokyo Electron Ltd | ロードロック装置を備えた処理装置 |
JP2566308B2 (ja) * | 1989-01-12 | 1996-12-25 | 東京エレクトロン株式会社 | ロードロック装置を備えた処理装置 |
JPH03184331A (ja) * | 1989-12-13 | 1991-08-12 | Hitachi Ltd | 複数真空処理装置 |
JPH04137613A (ja) * | 1990-09-28 | 1992-05-12 | Handotai Process Kenkyusho:Kk | 半導体装置の製造装置 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR900001365B1 (en) | Means for loading or unloading workpiece into or from a vacuum processing chamber | |
JPS6457637A (en) | Method and apparatus for handling wafer | |
GB2325939A (en) | Thermally conductive chuck for vacuum processor | |
DE3881616D1 (de) | Verfahren und vorrichtung zum beschichten von substraten. | |
ES442997A1 (es) | Procedimiento de obtencion de substratos cromogenicos para enzimas. | |
GB752841A (en) | Improvements in or relating to vacuum cleaning apparatus | |
FR2485678B1 (ja) | ||
GR880300095T1 (en) | Accessory for gas masks, and gas masks equipped therewith | |
JPS57134946A (en) | Carrying device for semiconductor substrate | |
JPS53131319A (en) | Exhaust brake arrangement | |
ATE56080T1 (de) | Wanddurchfuehrung. | |
JPS5441075A (en) | Conveying device between atmospheric pressure and vacuum | |
ATE34931T1 (de) | Vorrichtung zum verfuellen von evakuierten hohlraeumen in material bzw. in koerpern. | |
JPS5578859A (en) | Shaft sealing device | |
JPS54120354A (en) | Axial sealing device | |
JPS54143636A (en) | Printer | |
JPS6431970A (en) | Vacuum treatment equipment | |
EP0635875A4 (en) | ARRANGEMENT FOR THERMAL TREATMENT. | |
JPS5621329A (en) | Plasma treatment | |
GB1366749A (en) | Substrate protection device | |
BELLAH | Improved bondability to RTV silicone elastomer using rf-activated gas | |
JPS57143186A (en) | Sealing means of compressor | |
JPS5735681A (en) | Vacuum device | |
JPS5516475A (en) | Plasma processing unit | |
JPS545386A (en) | Surface processor for wafer |