JPS57132384A - Semiconductor laser device and manufacture thereof - Google Patents
Semiconductor laser device and manufacture thereofInfo
- Publication number
- JPS57132384A JPS57132384A JP1722681A JP1722681A JPS57132384A JP S57132384 A JPS57132384 A JP S57132384A JP 1722681 A JP1722681 A JP 1722681A JP 1722681 A JP1722681 A JP 1722681A JP S57132384 A JPS57132384 A JP S57132384A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- substrate
- current
- active layer
- lamination
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2238—Buried stripe structure with a terraced structure
Abstract
PURPOSE:To realize a high-efficiency laser oscilation by a method wherein two semiconductor regins are sandwiched between a semiconductor substrate and a lamination and a semiconductor clad layer included in the laminatin is continuously connected to the semiconductor substrate via a narrow passage provided between the two semiconductor regions. CONSTITUTION:Two p type or high resistance semiconductor regions 21 and 22 not comtinuously connected with each other are insertedly provided on the main surface 1 consisting of (a) and (b) of a semiconductor substrate 2 between said substrate 2 and a lamination 7. Accordingly, a current in an active layer 4 running from the clad layer 3 of the lamination 7 to the substrate 2 is provided with a surface (c) that is the only virtual passage for the current. The current in the active layer 4 is narrowed down when it leaves the active layer 4 toward the substrate 2 and the current running into the active layer 4 from the both sides thereof is also narrowed down. This setup results in a remarkably improved laser oscillation efficiency compared with a conventional setup.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1722681A JPS57132384A (en) | 1981-02-06 | 1981-02-06 | Semiconductor laser device and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1722681A JPS57132384A (en) | 1981-02-06 | 1981-02-06 | Semiconductor laser device and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57132384A true JPS57132384A (en) | 1982-08-16 |
Family
ID=11938028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1722681A Pending JPS57132384A (en) | 1981-02-06 | 1981-02-06 | Semiconductor laser device and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57132384A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60235486A (en) * | 1984-05-08 | 1985-11-22 | Matsushita Electric Ind Co Ltd | Semiconductor laser device and manufacture thereof |
JPS6136986A (en) * | 1984-07-30 | 1986-02-21 | Matsushita Electric Ind Co Ltd | Semiconductor light emitting device |
FR2693047A1 (en) * | 1992-06-24 | 1993-12-31 | Fujitsu Ltd | Heterostructure semiconductor laser fabrication method with epitaxy on mesa patterned substrate - using epitaxial MOCVD growth of current stop gallium arsenide layer on sides of mesa stripe, with tri:methyl gallium as source gas |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55105394A (en) * | 1979-02-07 | 1980-08-12 | Sharp Corp | Stripe structure of semiconductor laser element and its manufacture |
JPS55107291A (en) * | 1979-02-09 | 1980-08-16 | Sharp Corp | Structure and manufacture of semiconductor laser element stripe |
-
1981
- 1981-02-06 JP JP1722681A patent/JPS57132384A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55105394A (en) * | 1979-02-07 | 1980-08-12 | Sharp Corp | Stripe structure of semiconductor laser element and its manufacture |
JPS55107291A (en) * | 1979-02-09 | 1980-08-16 | Sharp Corp | Structure and manufacture of semiconductor laser element stripe |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60235486A (en) * | 1984-05-08 | 1985-11-22 | Matsushita Electric Ind Co Ltd | Semiconductor laser device and manufacture thereof |
JPS6136986A (en) * | 1984-07-30 | 1986-02-21 | Matsushita Electric Ind Co Ltd | Semiconductor light emitting device |
FR2693047A1 (en) * | 1992-06-24 | 1993-12-31 | Fujitsu Ltd | Heterostructure semiconductor laser fabrication method with epitaxy on mesa patterned substrate - using epitaxial MOCVD growth of current stop gallium arsenide layer on sides of mesa stripe, with tri:methyl gallium as source gas |
US5336635A (en) * | 1992-06-24 | 1994-08-09 | Fujitsu Limited | Manufacturing method of semiconductor laser of patterned-substrate type |
US5375136A (en) * | 1992-06-24 | 1994-12-20 | Fujitsu Limited | Semiconductor laser of patterned-substrate type and structure thereof |
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