JPS57130435A - Annealing method of matter by light beam - Google Patents
Annealing method of matter by light beamInfo
- Publication number
- JPS57130435A JPS57130435A JP1654481A JP1654481A JPS57130435A JP S57130435 A JPS57130435 A JP S57130435A JP 1654481 A JP1654481 A JP 1654481A JP 1654481 A JP1654481 A JP 1654481A JP S57130435 A JPS57130435 A JP S57130435A
- Authority
- JP
- Japan
- Prior art keywords
- matter
- vessel
- film
- scarcely
- irradiate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000137 annealing Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 abstract 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 abstract 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 230000002745 absorbent Effects 0.000 abstract 2
- 239000002250 absorbent Substances 0.000 abstract 2
- 150000004767 nitrides Chemical class 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- -1 ethyldiamine Chemical compound 0.000 abstract 1
- 235000011187 glycerol Nutrition 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1654481A JPS57130435A (en) | 1981-02-05 | 1981-02-05 | Annealing method of matter by light beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1654481A JPS57130435A (en) | 1981-02-05 | 1981-02-05 | Annealing method of matter by light beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57130435A true JPS57130435A (en) | 1982-08-12 |
| JPS628011B2 JPS628011B2 (enrdf_load_stackoverflow) | 1987-02-20 |
Family
ID=11919200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1654481A Granted JPS57130435A (en) | 1981-02-05 | 1981-02-05 | Annealing method of matter by light beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57130435A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62149881A (ja) * | 1985-12-24 | 1987-07-03 | Canon Inc | 堆積膜形成装置 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02130708U (enrdf_load_stackoverflow) * | 1989-03-31 | 1990-10-29 | ||
| JPH0340007U (enrdf_load_stackoverflow) * | 1989-08-28 | 1991-04-17 | ||
| JP5326183B2 (ja) * | 2005-10-14 | 2013-10-30 | 澁谷工業株式会社 | レーザアニール方法 |
-
1981
- 1981-02-05 JP JP1654481A patent/JPS57130435A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62149881A (ja) * | 1985-12-24 | 1987-07-03 | Canon Inc | 堆積膜形成装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS628011B2 (enrdf_load_stackoverflow) | 1987-02-20 |
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