JPS57501747A - - Google Patents

Info

Publication number
JPS57501747A
JPS57501747A JP56502378A JP50237881A JPS57501747A JP S57501747 A JPS57501747 A JP S57501747A JP 56502378 A JP56502378 A JP 56502378A JP 50237881 A JP50237881 A JP 50237881A JP S57501747 A JPS57501747 A JP S57501747A
Authority
JP
Japan
Prior art keywords
substrate
coating material
opaque layer
forming
radiant energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56502378A
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS57501747A publication Critical patent/JPS57501747A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56502378A 1980-06-19 1981-06-18 Pending JPS57501747A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US16097880A 1980-06-19 1980-06-19

Publications (1)

Publication Number Publication Date
JPS57501747A true JPS57501747A (enrdf_load_stackoverflow) 1982-09-24

Family

ID=22579284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56502378A Pending JPS57501747A (enrdf_load_stackoverflow) 1980-06-19 1981-06-18

Country Status (3)

Country Link
EP (1) EP0054068A1 (enrdf_load_stackoverflow)
JP (1) JPS57501747A (enrdf_load_stackoverflow)
WO (1) WO1981003628A1 (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58203443A (ja) * 1982-05-24 1983-11-26 Hitachi Ltd ホトマスクの白点欠陥修正用組成物
US4466992A (en) * 1982-05-28 1984-08-21 Phillips Petroleum Company Healing pinhole defects in amorphous silicon films
US7063919B2 (en) 2002-07-31 2006-06-20 Mancini David P Lithographic template having a repaired gap defect method of repair and use
CN102736405B (zh) * 2012-06-15 2014-07-16 深圳市华星光电技术有限公司 一种光罩及其修正方法
US8741506B2 (en) 2012-06-15 2014-06-03 Shenzhen China Star Optoelectronics Technology Co., Ltd. Mask and repairing method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03181945A (ja) * 1989-12-12 1991-08-07 Mitsubishi Electric Corp マスクのパターン欠け欠陥の修正方法

Also Published As

Publication number Publication date
WO1981003628A1 (en) 1981-12-24
EP0054068A1 (en) 1982-06-23

Similar Documents

Publication Publication Date Title
US4340654A (en) Defect-free photomask
JP2003164985A (ja) レーザー光による材料の同時一括溶融方法及び装置
SE7610739L (sv) Forfarande for framstellning av plantryckformar medelst laserstralar
KR880005474A (ko) 엑시머레이저에 의한 안과용 렌즈의 제조
NO852716L (no) Fremgangsmaate til dannelse av et makroskopisk flate-moenster med mikroskopisk struktur, saerlig en boeyningsoptisk virksom struktur
ATE196200T1 (de) Gravierverfahren mit bildmaske und lichtempfindlicher laminatfilm für besagte bildmaske
JPS57501747A (enrdf_load_stackoverflow)
FR2096342A5 (en) Laser beam marking technique - adhering light absorbent thermoplastic - particles in required pattern
EP0165686A3 (en) Method for repairing a photomask by laser-induced polymer degradation
JPS5672445A (en) Production of photomask
JPS54134561A (en) Pattern forming method
JPS5581438A (en) Manufacturing method of fluorescent display tube grid
JPS5587148A (en) Correction method for light shielding mask
JPS5622657A (en) Treatment of glass surface
JPS5688319A (en) Method for forming film pattern
JPS5752052A (en) Heat treatment of photosensitive resin
JPS57130435A (en) Annealing method of matter by light beam
NL7504118A (nl) Werkwijze voor het aanbrengen van naast elkaar liggende, dicht aan elkaar aansluitende, ver- schillende lagen op een transparante onderlaag.
JPS5767117A (en) Heat treatment for metal mold
JPS56100417A (en) Forming method for resist pattern
JPS5740928A (en) Processing method of resist
ATE181970T1 (de) Verfahren zum beschichten von kupferwerkstoffen
JPS6428836A (en) Selection of semiconductor chip
US1612001A (en) Method of making bas-reliefs
JPS56162750A (en) Defect correcting method for photomask