JPS57128024A - Single crystallization for non-single crystalline semiconductor layer - Google Patents

Single crystallization for non-single crystalline semiconductor layer

Info

Publication number
JPS57128024A
JPS57128024A JP56012549A JP1254981A JPS57128024A JP S57128024 A JPS57128024 A JP S57128024A JP 56012549 A JP56012549 A JP 56012549A JP 1254981 A JP1254981 A JP 1254981A JP S57128024 A JPS57128024 A JP S57128024A
Authority
JP
Japan
Prior art keywords
scanned
scanning
region
crystal
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56012549A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6329819B2 (OSRAM
Inventor
Junji Sakurai
Haruhisa Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56012549A priority Critical patent/JPS57128024A/ja
Publication of JPS57128024A publication Critical patent/JPS57128024A/ja
Publication of JPS6329819B2 publication Critical patent/JPS6329819B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/3808
    • H10P14/382

Landscapes

  • Recrystallisation Techniques (AREA)
JP56012549A 1981-01-30 1981-01-30 Single crystallization for non-single crystalline semiconductor layer Granted JPS57128024A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56012549A JPS57128024A (en) 1981-01-30 1981-01-30 Single crystallization for non-single crystalline semiconductor layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56012549A JPS57128024A (en) 1981-01-30 1981-01-30 Single crystallization for non-single crystalline semiconductor layer

Publications (2)

Publication Number Publication Date
JPS57128024A true JPS57128024A (en) 1982-08-09
JPS6329819B2 JPS6329819B2 (OSRAM) 1988-06-15

Family

ID=11808407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56012549A Granted JPS57128024A (en) 1981-01-30 1981-01-30 Single crystallization for non-single crystalline semiconductor layer

Country Status (1)

Country Link
JP (1) JPS57128024A (OSRAM)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119824A (ja) * 1982-12-27 1984-07-11 Fujitsu Ltd 半導体装置の製造方法
JPS59224121A (ja) * 1983-06-03 1984-12-17 Agency Of Ind Science & Technol レ−ザアニ−リング装置
JPS6076117A (ja) * 1983-09-30 1985-04-30 Sony Corp 半導体薄膜の結晶化方法
JPS60126840A (ja) * 1983-12-13 1985-07-06 Matsushita Electric Ind Co Ltd Soi形成用レーザ照射方法
JPS60189216A (ja) * 1984-03-08 1985-09-26 Agency Of Ind Science & Technol レ−ザアニ−リング装置
JPS62145718A (ja) * 1985-12-20 1987-06-29 Agency Of Ind Science & Technol 半導体単結晶層の製造方法
JPS62216318A (ja) * 1986-03-18 1987-09-22 Fujitsu Ltd レ−ザアニ−ル装置
JPH01246829A (ja) * 1988-03-28 1989-10-02 Tokyo Electron Ltd ビームアニール装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02128314U (OSRAM) * 1989-03-29 1990-10-23

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52115681A (en) * 1975-12-10 1977-09-28 Shii Shii Fuan Jiyon Method of improving crystallinity of semiconductor coating by scanning laser beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52115681A (en) * 1975-12-10 1977-09-28 Shii Shii Fuan Jiyon Method of improving crystallinity of semiconductor coating by scanning laser beam

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119824A (ja) * 1982-12-27 1984-07-11 Fujitsu Ltd 半導体装置の製造方法
JPS59224121A (ja) * 1983-06-03 1984-12-17 Agency Of Ind Science & Technol レ−ザアニ−リング装置
JPS6076117A (ja) * 1983-09-30 1985-04-30 Sony Corp 半導体薄膜の結晶化方法
JPS60126840A (ja) * 1983-12-13 1985-07-06 Matsushita Electric Ind Co Ltd Soi形成用レーザ照射方法
JPS60189216A (ja) * 1984-03-08 1985-09-26 Agency Of Ind Science & Technol レ−ザアニ−リング装置
JPS62145718A (ja) * 1985-12-20 1987-06-29 Agency Of Ind Science & Technol 半導体単結晶層の製造方法
JPS62216318A (ja) * 1986-03-18 1987-09-22 Fujitsu Ltd レ−ザアニ−ル装置
JPH01246829A (ja) * 1988-03-28 1989-10-02 Tokyo Electron Ltd ビームアニール装置

Also Published As

Publication number Publication date
JPS6329819B2 (OSRAM) 1988-06-15

Similar Documents

Publication Publication Date Title
KR900003255B1 (ko) 단결정막의 제조 방법
EP1328014A4 (en) SEMICONDUCTOR BASE MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
JPS5640291A (en) Preparation of semiconductor laser element
JPS57128024A (en) Single crystallization for non-single crystalline semiconductor layer
JPS57128092A (en) Imbedded type semiconductor laser device
JPS5541709A (en) Sos semiconductor base
JPS544088A (en) Manufacture for semiconductor laser
JPH0719745B2 (ja) 半導体装置の製造方法
JPS5749225A (en) Single-crystallizing method for non-single crystalline semiconductor layer
Yershov et al. Preparation of gallium arsenide films on insulators by artificial epitaxy
JPS57129899A (en) Manufacture of single crystal of 3-5 group compound semiconductor
JPS6449257A (en) Thin-film transistor
Minagawa et al. LPE growth of silicon from poly Si/Si structure using CW argon laser
JPS52109866A (en) Liquid epitaxial growing method
JPS57106599A (en) Liquid phase growth device
JPS6427221A (en) Manufacture of laminated type semiconductor device
JPS5391572A (en) Liquid-phase growth method for semiconductor crystal
JPS63150911A (ja) 半導体装置の製造方法
JPH04214615A (ja) 半導体デバイスの製造方法
KR930005271A (ko) 화합물 반도체를 이용한 광전소자의 제조방법
JPS6442117A (en) Crystal growth method
JPH0247435B2 (ja) Gaasekisoepitakisharuseichoho
JPH0479993B2 (OSRAM)
JPS6482525A (en) Manufacture of semiconductor device
JPS5526618A (en) Method of growing semiconductor crystal