JPS571253A - Integrated circuit - Google Patents

Integrated circuit

Info

Publication number
JPS571253A
JPS571253A JP10693980A JP10693980A JPS571253A JP S571253 A JPS571253 A JP S571253A JP 10693980 A JP10693980 A JP 10693980A JP 10693980 A JP10693980 A JP 10693980A JP S571253 A JPS571253 A JP S571253A
Authority
JP
Japan
Prior art keywords
layer
gate
source
line
address
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10693980A
Other languages
Japanese (ja)
Other versions
JPH0131307B2 (en
Inventor
Tadashi Kuragami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP10693980A priority Critical patent/JPS571253A/en
Publication of JPS571253A publication Critical patent/JPS571253A/en
Publication of JPH0131307B2 publication Critical patent/JPH0131307B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices

Landscapes

  • Semiconductor Memories (AREA)

Abstract

PURPOSE:To reduce the area of an IC having plural memory cells by a method wherein wirings of the first layer and the second layer are accumulated in the direction of an address line, and either of the layers is made as the address line. CONSTITUTION:A layer 401 for drain to be used both as a write line and a transistor (Tr)Q3, a source 402 to be used both as an earthing line and a TrQ2, a drain 403 to be used both as a write line and a TrQ1 are extended in the direction of bit, and the MOSTrQ3 consisted of a gate region 406, a gate metal wiring 410, a source 404, the MOSTrQ2 consisted of a drain 404 (a source of the Q1), a gate 407, a gate wiring 411, and the MOSTrQ1 consisted of a source 405 having an electrode window 400, a gate region 408, a gate wiring 412 are arranged, penetrating connecting holes 414, 415 are provided in an interlayer insulating film 413, and the address metal wiring 416 is provided on the second layer. The center of the sources and drains of the Tr's Q1-Q3 are arranged on a nearly straight line. By this constitution, because the transistors in the memory cells come under the address wiring of the second layer, the area of the cells (inside of x marks) become extremely small and the connecting hole can get along with one hole per cell, so that useless part of the diffusion region can be reduced.
JP10693980A 1980-08-04 1980-08-04 Integrated circuit Granted JPS571253A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10693980A JPS571253A (en) 1980-08-04 1980-08-04 Integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10693980A JPS571253A (en) 1980-08-04 1980-08-04 Integrated circuit

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2070771A Division JPS5647701B1 (en) 1971-04-06 1971-04-06

Publications (2)

Publication Number Publication Date
JPS571253A true JPS571253A (en) 1982-01-06
JPH0131307B2 JPH0131307B2 (en) 1989-06-26

Family

ID=14446348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10693980A Granted JPS571253A (en) 1980-08-04 1980-08-04 Integrated circuit

Country Status (1)

Country Link
JP (1) JPS571253A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4716452A (en) * 1984-11-09 1987-12-29 Kabushiki Kaisha Toshiba Semiconductor integrated circuit device constructed by polycell technique

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4716452A (en) * 1984-11-09 1987-12-29 Kabushiki Kaisha Toshiba Semiconductor integrated circuit device constructed by polycell technique

Also Published As

Publication number Publication date
JPH0131307B2 (en) 1989-06-26

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