JPS571253A - Integrated circuit - Google Patents
Integrated circuitInfo
- Publication number
- JPS571253A JPS571253A JP10693980A JP10693980A JPS571253A JP S571253 A JPS571253 A JP S571253A JP 10693980 A JP10693980 A JP 10693980A JP 10693980 A JP10693980 A JP 10693980A JP S571253 A JPS571253 A JP S571253A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gate
- source
- line
- address
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
Landscapes
- Semiconductor Memories (AREA)
Abstract
PURPOSE:To reduce the area of an IC having plural memory cells by a method wherein wirings of the first layer and the second layer are accumulated in the direction of an address line, and either of the layers is made as the address line. CONSTITUTION:A layer 401 for drain to be used both as a write line and a transistor (Tr)Q3, a source 402 to be used both as an earthing line and a TrQ2, a drain 403 to be used both as a write line and a TrQ1 are extended in the direction of bit, and the MOSTrQ3 consisted of a gate region 406, a gate metal wiring 410, a source 404, the MOSTrQ2 consisted of a drain 404 (a source of the Q1), a gate 407, a gate wiring 411, and the MOSTrQ1 consisted of a source 405 having an electrode window 400, a gate region 408, a gate wiring 412 are arranged, penetrating connecting holes 414, 415 are provided in an interlayer insulating film 413, and the address metal wiring 416 is provided on the second layer. The center of the sources and drains of the Tr's Q1-Q3 are arranged on a nearly straight line. By this constitution, because the transistors in the memory cells come under the address wiring of the second layer, the area of the cells (inside of x marks) become extremely small and the connecting hole can get along with one hole per cell, so that useless part of the diffusion region can be reduced.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10693980A JPS571253A (en) | 1980-08-04 | 1980-08-04 | Integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10693980A JPS571253A (en) | 1980-08-04 | 1980-08-04 | Integrated circuit |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2070771A Division JPS5647701B1 (en) | 1971-04-06 | 1971-04-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS571253A true JPS571253A (en) | 1982-01-06 |
JPH0131307B2 JPH0131307B2 (en) | 1989-06-26 |
Family
ID=14446348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10693980A Granted JPS571253A (en) | 1980-08-04 | 1980-08-04 | Integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS571253A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4716452A (en) * | 1984-11-09 | 1987-12-29 | Kabushiki Kaisha Toshiba | Semiconductor integrated circuit device constructed by polycell technique |
-
1980
- 1980-08-04 JP JP10693980A patent/JPS571253A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4716452A (en) * | 1984-11-09 | 1987-12-29 | Kabushiki Kaisha Toshiba | Semiconductor integrated circuit device constructed by polycell technique |
Also Published As
Publication number | Publication date |
---|---|
JPH0131307B2 (en) | 1989-06-26 |
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