JPS571252A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS571252A JPS571252A JP7520680A JP7520680A JPS571252A JP S571252 A JPS571252 A JP S571252A JP 7520680 A JP7520680 A JP 7520680A JP 7520680 A JP7520680 A JP 7520680A JP S571252 A JPS571252 A JP S571252A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- specific resistance
- type
- substrate
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 5
- 239000012535 impurity Substances 0.000 abstract 3
- 239000003990 capacitor Substances 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7520680A JPS571252A (en) | 1980-06-03 | 1980-06-03 | Semiconductor device |
US06/596,577 US4535530A (en) | 1980-06-03 | 1984-04-05 | Process for manufacturing a semiconductor memory device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7520680A JPS571252A (en) | 1980-06-03 | 1980-06-03 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS571252A true JPS571252A (en) | 1982-01-06 |
JPH028464B2 JPH028464B2 (enrdf_load_stackoverflow) | 1990-02-23 |
Family
ID=13569482
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7520680A Granted JPS571252A (en) | 1980-06-03 | 1980-06-03 | Semiconductor device |
Country Status (2)
Country | Link |
---|---|
US (1) | US4535530A (enrdf_load_stackoverflow) |
JP (1) | JPS571252A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5049959A (en) * | 1984-04-17 | 1991-09-17 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor integrated circuit device |
US5427113A (en) * | 1988-02-20 | 1995-06-27 | Hiroshi; Motoyama | Biological information measuring system |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4696092A (en) * | 1984-07-02 | 1987-09-29 | Texas Instruments Incorporated | Method of making field-plate isolated CMOS devices |
US4670669A (en) * | 1984-08-13 | 1987-06-02 | International Business Machines Corporation | Charge pumping structure for a substrate bias generator |
US5923985A (en) * | 1987-01-05 | 1999-07-13 | Seiko Instruments Inc. | MOS field effect transistor and its manufacturing method |
US6563192B1 (en) | 1995-12-22 | 2003-05-13 | Micron Technology, Inc. | Semiconductor die with integral decoupling capacitor |
US6285070B1 (en) | 1995-12-22 | 2001-09-04 | Micron Technology, Inc. | Method of forming semiconductor die with integral decoupling capacitor |
US20050269614A1 (en) * | 2004-06-08 | 2005-12-08 | Chung-Cheng Tsou | Non-junction-leakage 1T-RAM cell |
FR2960097A1 (fr) * | 2010-05-11 | 2011-11-18 | St Microelectronics Tours Sas | Composant de protection bidirectionnel |
US10158043B2 (en) * | 2014-05-30 | 2018-12-18 | Mikro Mesa Technolgy Co., Ltd. | Light-emitting diode and method for manufacturing the same |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4112575A (en) * | 1976-12-20 | 1978-09-12 | Texas Instruments Incorporated | Fabrication methods for the high capacity ram cell |
US4247862B1 (en) * | 1977-08-26 | 1995-12-26 | Intel Corp | Ionzation resistant mos structure |
US4196228A (en) * | 1978-06-10 | 1980-04-01 | Monolithic Memories, Inc. | Fabrication of high resistivity semiconductor resistors by ion implanatation |
US4168997A (en) * | 1978-10-10 | 1979-09-25 | National Semiconductor Corporation | Method for making integrated circuit transistors with isolation and substrate connected collectors utilizing simultaneous outdiffusion to convert an epitaxial layer |
JPS5555557A (en) * | 1978-10-20 | 1980-04-23 | Hitachi Ltd | Dynamic memory cell |
US4313253A (en) * | 1979-07-30 | 1982-02-02 | Burroughs Corporation | Method of fabricating a charge transfer channel covered by a stepped insulating layer |
JPS5826829B2 (ja) * | 1979-08-30 | 1983-06-06 | 富士通株式会社 | ダイナミックメモリセルの製造方法 |
US4328610A (en) * | 1980-04-25 | 1982-05-11 | Burroughs Corporation | Method of reducing alpha-particle induced errors in an integrated circuit |
US4403399A (en) * | 1981-09-28 | 1983-09-13 | Harris Corporation | Method of fabricating a vertical fuse utilizing epitaxial deposition and special masking |
-
1980
- 1980-06-03 JP JP7520680A patent/JPS571252A/ja active Granted
-
1984
- 1984-04-05 US US06/596,577 patent/US4535530A/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5049959A (en) * | 1984-04-17 | 1991-09-17 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor integrated circuit device |
US5427113A (en) * | 1988-02-20 | 1995-06-27 | Hiroshi; Motoyama | Biological information measuring system |
Also Published As
Publication number | Publication date |
---|---|
US4535530A (en) | 1985-08-20 |
JPH028464B2 (enrdf_load_stackoverflow) | 1990-02-23 |
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