JPS57122437A - Glass mask - Google Patents

Glass mask

Info

Publication number
JPS57122437A
JPS57122437A JP862681A JP862681A JPS57122437A JP S57122437 A JPS57122437 A JP S57122437A JP 862681 A JP862681 A JP 862681A JP 862681 A JP862681 A JP 862681A JP S57122437 A JPS57122437 A JP S57122437A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
glass mask
shape
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP862681A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6217743B2 (cg-RX-API-DMAC7.html
Inventor
Sadaaki Nishi
Isao Nagashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP862681A priority Critical patent/JPS57122437A/ja
Publication of JPS57122437A publication Critical patent/JPS57122437A/ja
Publication of JPS6217743B2 publication Critical patent/JPS6217743B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP862681A 1981-01-23 1981-01-23 Glass mask Granted JPS57122437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP862681A JPS57122437A (en) 1981-01-23 1981-01-23 Glass mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP862681A JPS57122437A (en) 1981-01-23 1981-01-23 Glass mask

Publications (2)

Publication Number Publication Date
JPS57122437A true JPS57122437A (en) 1982-07-30
JPS6217743B2 JPS6217743B2 (cg-RX-API-DMAC7.html) 1987-04-20

Family

ID=11698154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP862681A Granted JPS57122437A (en) 1981-01-23 1981-01-23 Glass mask

Country Status (1)

Country Link
JP (1) JPS57122437A (cg-RX-API-DMAC7.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5376774U (cg-RX-API-DMAC7.html) * 1976-11-30 1978-06-27

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5376774U (cg-RX-API-DMAC7.html) * 1976-11-30 1978-06-27

Also Published As

Publication number Publication date
JPS6217743B2 (cg-RX-API-DMAC7.html) 1987-04-20

Similar Documents

Publication Publication Date Title
JPS56160050A (en) Semiconductor device and manufacture thereof
TW269052B (en) Process for semiconductor wafer, semiconductor integrated circuit and devices thereof
JPS548462A (en) Manufacture for semiconductor
JPS57122437A (en) Glass mask
JPS56162747A (en) Mask for exposure to light
JPS53119686A (en) Production of semiconductor device
JPS57152130A (en) Semiconductor device
JPS53108287A (en) Manufacture of semiconductor device
JPS5424571A (en) Manufacture for semiconductor wafer
JPS56140626A (en) Manufacture of semiconductor device
JPS5512784A (en) Location mark for electron beam exposure
JPS551110A (en) Exposure to electron beam
JPS544084A (en) Manufacture for semiconductor integrated circuit
JPS641233A (en) Manufacture of semiconductor device and mask used in the same
JPS5596681A (en) Method of fabricating semiconductor device
JPS53106574A (en) Production of photoetching mask for production of semiconductor device
JPS5555528A (en) Mask aligner
JPS52119179A (en) Electron beam exposing method
JPS53106575A (en) Production of photoetching mask for production of semiconductor device
JPS5669855A (en) Semiconductor device and its manufacture
JPS5421173A (en) Manufacture for semiconductor having oxide film
JPS5288090A (en) Vacuum pincette
JPS53116774A (en) Production of semiconductor device
JPS5768028A (en) Specimen substrate for charged beam exposure
JPS55156329A (en) Manufacture for integrated element