JPS57114292A - Thin film image pickup element - Google Patents
Thin film image pickup elementInfo
- Publication number
- JPS57114292A JPS57114292A JP56000162A JP16281A JPS57114292A JP S57114292 A JPS57114292 A JP S57114292A JP 56000162 A JP56000162 A JP 56000162A JP 16281 A JP16281 A JP 16281A JP S57114292 A JPS57114292 A JP S57114292A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- layer
- covering
- thin film
- pickup element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/024—Details of scanning heads ; Means for illuminating the original
- H04N1/028—Details of scanning heads ; Means for illuminating the original for picture information pick-up
- H04N1/02805—Details of scanning heads ; Means for illuminating the original for picture information pick-up with photodetectors arranged in a two-dimensional array
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/024—Details of scanning heads ; Means for illuminating the original
- H04N1/028—Details of scanning heads ; Means for illuminating the original for picture information pick-up
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/227—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a Schottky barrier
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/191—Photoconductor image sensors
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Facsimile Heads (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56000162A JPS57114292A (en) | 1981-01-06 | 1981-01-06 | Thin film image pickup element |
US06/336,991 US4471371A (en) | 1981-01-06 | 1982-01-04 | Thin film image pickup element |
US06/582,642 US4517733A (en) | 1981-01-06 | 1984-02-22 | Process for fabricating thin film image pick-up element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56000162A JPS57114292A (en) | 1981-01-06 | 1981-01-06 | Thin film image pickup element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57114292A true JPS57114292A (en) | 1982-07-16 |
JPS6258550B2 JPS6258550B2 (enrdf_load_stackoverflow) | 1987-12-07 |
Family
ID=11466338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56000162A Granted JPS57114292A (en) | 1981-01-06 | 1981-01-06 | Thin film image pickup element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57114292A (enrdf_load_stackoverflow) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59126666A (ja) * | 1983-01-10 | 1984-07-21 | Seiko Epson Corp | 固体イメ−ジセンサ |
JPS59185474A (ja) * | 1983-04-04 | 1984-10-22 | Seiko Epson Corp | 固体イメ−ジセンサ |
JPS59188168A (ja) * | 1983-04-08 | 1984-10-25 | Seiko Epson Corp | 光電変換装置 |
US4823178A (en) * | 1984-09-29 | 1989-04-18 | Kabushiki Kaisha Toshiba | Photosensor suited for image sensor |
JPH0620568U (ja) * | 1992-02-29 | 1994-03-18 | 株式会社ノーリツ | 排水トラップ用のエクステンション装置 |
JP2001291854A (ja) * | 2000-04-07 | 2001-10-19 | Matsushita Electric Ind Co Ltd | 2次元x線センサおよびその製造方法 |
JP2011139069A (ja) * | 2009-12-30 | 2011-07-14 | Commissariat A L'energie Atomique & Aux Energies Alternatives | 集積ダイアモンド変換画素化撮像装置及びその製造方法 |
-
1981
- 1981-01-06 JP JP56000162A patent/JPS57114292A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59126666A (ja) * | 1983-01-10 | 1984-07-21 | Seiko Epson Corp | 固体イメ−ジセンサ |
JPS59185474A (ja) * | 1983-04-04 | 1984-10-22 | Seiko Epson Corp | 固体イメ−ジセンサ |
JPS59188168A (ja) * | 1983-04-08 | 1984-10-25 | Seiko Epson Corp | 光電変換装置 |
US4823178A (en) * | 1984-09-29 | 1989-04-18 | Kabushiki Kaisha Toshiba | Photosensor suited for image sensor |
JPH0620568U (ja) * | 1992-02-29 | 1994-03-18 | 株式会社ノーリツ | 排水トラップ用のエクステンション装置 |
JP2001291854A (ja) * | 2000-04-07 | 2001-10-19 | Matsushita Electric Ind Co Ltd | 2次元x線センサおよびその製造方法 |
JP2011139069A (ja) * | 2009-12-30 | 2011-07-14 | Commissariat A L'energie Atomique & Aux Energies Alternatives | 集積ダイアモンド変換画素化撮像装置及びその製造方法 |
JP2017120266A (ja) * | 2009-12-30 | 2017-07-06 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 集積ダイアモンド変換画素化撮像装置及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6258550B2 (enrdf_load_stackoverflow) | 1987-12-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS55120182A (en) | Photoelectric converter | |
JPS5721163A (en) | Optical sensor array device | |
JPS6468728A (en) | Thin film transistor | |
CA2054795A1 (en) | Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material and method for manufacturing the same | |
JPS57114292A (en) | Thin film image pickup element | |
KR830006825A (ko) | 광전변환장치(光電變換裝置) | |
JPS57100770A (en) | Switching element | |
JPS57115880A (en) | Thin film image pickup device in two dimensions | |
JPS6468726A (en) | Thin film transistor and its manufacture | |
JPS57183076A (en) | Field control type optical semiconductor device | |
JPS5732683A (en) | Semiconductor device | |
JPS6468729A (en) | Manufacture of thin film transistor | |
JPS5742174A (en) | Solid image pickup device | |
JPS57157563A (en) | Semiconductor device | |
JPS6461052A (en) | Photoelectric device | |
JPS5732183A (en) | Solid state image pickup device | |
JPS5630373A (en) | Solid image pickup unit | |
JPS57160156A (en) | Semiconductor device | |
JPS57114287A (en) | Semiconductor device | |
JPS5710247A (en) | Semiconductor device | |
JPS6472556A (en) | Manufacture of photoelectric conversion device | |
JPS61168224A (ja) | 金属配線層 | |
JPS6480080A (en) | Contact type image sensor | |
JPS5658288A (en) | Semiconductor device | |
JPS57192071A (en) | Solid-state image pickup element |