JPS57110674A - Surface treating device - Google Patents

Surface treating device

Info

Publication number
JPS57110674A
JPS57110674A JP18783680A JP18783680A JPS57110674A JP S57110674 A JPS57110674 A JP S57110674A JP 18783680 A JP18783680 A JP 18783680A JP 18783680 A JP18783680 A JP 18783680A JP S57110674 A JPS57110674 A JP S57110674A
Authority
JP
Japan
Prior art keywords
laminar flow
developing
developing soln
chuck
drain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18783680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6253591B2 (enrdf_load_stackoverflow
Inventor
Masafumi Suzuki
Masayasu Nagashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18783680A priority Critical patent/JPS57110674A/ja
Publication of JPS57110674A publication Critical patent/JPS57110674A/ja
Publication of JPS6253591B2 publication Critical patent/JPS6253591B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • ing And Chemical Polishing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP18783680A 1980-12-29 1980-12-29 Surface treating device Granted JPS57110674A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18783680A JPS57110674A (en) 1980-12-29 1980-12-29 Surface treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18783680A JPS57110674A (en) 1980-12-29 1980-12-29 Surface treating device

Publications (2)

Publication Number Publication Date
JPS57110674A true JPS57110674A (en) 1982-07-09
JPS6253591B2 JPS6253591B2 (enrdf_load_stackoverflow) 1987-11-11

Family

ID=16213077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18783680A Granted JPS57110674A (en) 1980-12-29 1980-12-29 Surface treating device

Country Status (1)

Country Link
JP (1) JPS57110674A (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015637A (ja) * 1983-07-07 1985-01-26 Fujitsu Ltd レジスト膜の現像方法
JPS6088944A (ja) * 1983-10-21 1985-05-18 Fujitsu Ltd レジスト膜の現像方法
JPS6192053U (enrdf_load_stackoverflow) * 1984-11-21 1986-06-14
US5778913A (en) * 1997-02-20 1998-07-14 Lucent Technologies Inc. Cleaning solder-bonded flip-chip assemblies
DE19505981C2 (de) * 1995-02-21 1998-11-05 Siemens Ag Verfahren und Anordnung zum einseitigen, naßchemischen Ätzen einer Substratscheibe
DE10313127B4 (de) * 2003-03-24 2006-10-12 Rena Sondermaschinen Gmbh Verfahren zur Behandlung von Substratoberflächen
FR2971065A1 (fr) * 2011-01-28 2012-08-03 Commissariat Energie Atomique Dispositif et procede de developpement de motifs a haut rapport de forme
US9318358B2 (en) 2011-04-28 2016-04-19 Infineon Technologies Ag Etching device and a method for etching a material of a workpiece

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03165486A (ja) * 1989-11-24 1991-07-17 Tokyo Erekutoron Kyushu Kk 処理液温度調節装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509891U (enrdf_load_stackoverflow) * 1973-05-24 1975-01-31
JPS5417572A (en) * 1977-07-11 1979-02-08 Fuji Fuirutaa Kougiyou Kk Filter for melted fluid

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509891U (enrdf_load_stackoverflow) * 1973-05-24 1975-01-31
JPS5417572A (en) * 1977-07-11 1979-02-08 Fuji Fuirutaa Kougiyou Kk Filter for melted fluid

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6015637A (ja) * 1983-07-07 1985-01-26 Fujitsu Ltd レジスト膜の現像方法
JPS6088944A (ja) * 1983-10-21 1985-05-18 Fujitsu Ltd レジスト膜の現像方法
JPS6192053U (enrdf_load_stackoverflow) * 1984-11-21 1986-06-14
DE19505981C2 (de) * 1995-02-21 1998-11-05 Siemens Ag Verfahren und Anordnung zum einseitigen, naßchemischen Ätzen einer Substratscheibe
US5778913A (en) * 1997-02-20 1998-07-14 Lucent Technologies Inc. Cleaning solder-bonded flip-chip assemblies
DE10313127B4 (de) * 2003-03-24 2006-10-12 Rena Sondermaschinen Gmbh Verfahren zur Behandlung von Substratoberflächen
FR2971065A1 (fr) * 2011-01-28 2012-08-03 Commissariat Energie Atomique Dispositif et procede de developpement de motifs a haut rapport de forme
US9318358B2 (en) 2011-04-28 2016-04-19 Infineon Technologies Ag Etching device and a method for etching a material of a workpiece

Also Published As

Publication number Publication date
JPS6253591B2 (enrdf_load_stackoverflow) 1987-11-11

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