JPS57102926A - Light- or radiation-sensitive polymer composition - Google Patents

Light- or radiation-sensitive polymer composition

Info

Publication number
JPS57102926A
JPS57102926A JP17720080A JP17720080A JPS57102926A JP S57102926 A JPS57102926 A JP S57102926A JP 17720080 A JP17720080 A JP 17720080A JP 17720080 A JP17720080 A JP 17720080A JP S57102926 A JPS57102926 A JP S57102926A
Authority
JP
Japan
Prior art keywords
light
radiation
group
sensitizer
formulas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17720080A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6337823B2 (enrdf_load_stackoverflow
Inventor
Fumio Kataoka
Fusaji Shoji
Isao Obara
Ataru Yokono
Tokio Isogai
Mitsuo Kojima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP17720080A priority Critical patent/JPS57102926A/ja
Priority to GB8137851A priority patent/GB2092164B/en
Priority to KR1019810004998A priority patent/KR860000070B1/ko
Priority to FR8123637A priority patent/FR2496111B1/fr
Priority to DE3150054A priority patent/DE3150054C2/de
Priority to US06/331,875 priority patent/US4451551A/en
Publication of JPS57102926A publication Critical patent/JPS57102926A/ja
Publication of JPS6337823B2 publication Critical patent/JPS6337823B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP17720080A 1980-12-17 1980-12-17 Light- or radiation-sensitive polymer composition Granted JPS57102926A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP17720080A JPS57102926A (en) 1980-12-17 1980-12-17 Light- or radiation-sensitive polymer composition
GB8137851A GB2092164B (en) 1980-12-17 1981-12-16 Loght or radiation-sensitive polymer composition
KR1019810004998A KR860000070B1 (ko) 1980-12-17 1981-12-16 광 또는 방사선 감응성 중합체조성물
FR8123637A FR2496111B1 (fr) 1980-12-17 1981-12-17 Composition polymere sensible a la lumiere ou aux radiations, son utilisation pour former des dessins en relief, et composes entrant dans cette composition
DE3150054A DE3150054C2 (de) 1980-12-17 1981-12-17 Licht- oder strahlungsempfindliche Polymerzusammensetzungen und ihre Verwendung
US06/331,875 US4451551A (en) 1980-12-17 1981-12-17 Radiation-sensitive poly(amic acid) polymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17720080A JPS57102926A (en) 1980-12-17 1980-12-17 Light- or radiation-sensitive polymer composition

Publications (2)

Publication Number Publication Date
JPS57102926A true JPS57102926A (en) 1982-06-26
JPS6337823B2 JPS6337823B2 (enrdf_load_stackoverflow) 1988-07-27

Family

ID=16026920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17720080A Granted JPS57102926A (en) 1980-12-17 1980-12-17 Light- or radiation-sensitive polymer composition

Country Status (1)

Country Link
JP (1) JPS57102926A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5915449A (ja) * 1982-07-16 1984-01-26 Nitto Electric Ind Co Ltd 感光性樹脂組成物
JPS5968331A (ja) * 1982-10-13 1984-04-18 Nitto Electric Ind Co Ltd 感光性樹脂組成物
JPS5968332A (ja) * 1982-10-13 1984-04-18 Nitto Electric Ind Co Ltd 感光性樹脂組成物
JPS6042425A (ja) * 1983-08-17 1985-03-06 Toray Ind Inc 化学線感応性重合体組成物

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5915449A (ja) * 1982-07-16 1984-01-26 Nitto Electric Ind Co Ltd 感光性樹脂組成物
JPS5968331A (ja) * 1982-10-13 1984-04-18 Nitto Electric Ind Co Ltd 感光性樹脂組成物
JPS5968332A (ja) * 1982-10-13 1984-04-18 Nitto Electric Ind Co Ltd 感光性樹脂組成物
JPS6042425A (ja) * 1983-08-17 1985-03-06 Toray Ind Inc 化学線感応性重合体組成物

Also Published As

Publication number Publication date
JPS6337823B2 (enrdf_load_stackoverflow) 1988-07-27

Similar Documents

Publication Publication Date Title
AU2191483A (en) Thermo-corsslinking light sensitive composition
HK69085A (en) Radiation polymerizable composition for forming heat-resistant relief structures on electrical devices such as semiconductors and capacitors
JPS5280022A (en) Light solubilizable composition
JPS5321923A (en) Photopolymerizable composition
ES8705302A1 (es) Un procedimiento para preparar un elemento fotosensible
JPS56110927A (en) Manufacture of silver halide photographic material
TW327653B (en) Photoresist composition and lithographic process using the same
JPS57102926A (en) Light- or radiation-sensitive polymer composition
JPS54119941A (en) Liquid crystal display element
DE3664824D1 (en) Process for producing a positive photoresist
JPS569723A (en) Liquid crystal display element
JPS5773984A (en) Manufacture of photodetector
JPS55164825A (en) Polymer positive image forming method
JPS52149978A (en) Developing treatment method of photoresist film
JPS5339060A (en) Lot number marking method to wafers
JPS538073A (en) Mis type semiconductor device
JPS54974A (en) Manufacture for semiconductor device
JPS558013A (en) Semiconductor device manufacturing method
JPS53101979A (en) Semiconductor device
JPS5669628A (en) Developer composition for lithographic plate
JPS5376745A (en) Production of semiconductor device
JPS5365665A (en) Exfoliation of photo resist film
JPS5730832A (en) Developing solution for use in positive type photoresist
JPS5246830A (en) Liquid crystal panel
JPS54153622A (en) Photosensitive composition and image formation method using this