JPS54153622A - Photosensitive composition and image formation method using this - Google Patents
Photosensitive composition and image formation method using thisInfo
- Publication number
- JPS54153622A JPS54153622A JP6194178A JP6194178A JPS54153622A JP S54153622 A JPS54153622 A JP S54153622A JP 6194178 A JP6194178 A JP 6194178A JP 6194178 A JP6194178 A JP 6194178A JP S54153622 A JPS54153622 A JP S54153622A
- Authority
- JP
- Japan
- Prior art keywords
- base
- photosensitive composition
- film
- image formation
- image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To enable an image of high resolution to be formed on a base by stripping development using a polyhalogen compound, a polymer plasticizer having phenolic rings and/or a naphthol derivative.
CONSTITUTION: The layer of photosensitive composition containing a polymer havig phenol rings, e.g. a m-cresol type novolak resin, a polyhalogen compound, preferably in an amount of 5 to 30% wt. based on the resin, e.g. CHI3, and α- naphthol or a plasticizer, such as phthalic acid esters is prepared on a proper base and covered with a transparent cover film. This photosensitive image formation material is imagewise sxposed throught the transparent cover film, then heated preferably to 60 to 85°C, and stripped of the film when it is hot. The exposed area of the photosensitive composition layer is sticked to the film and revomed from the base. On the other hand, its unexposed area remains on the base and forms a relief image.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6194178A JPS54153622A (en) | 1978-05-24 | 1978-05-24 | Photosensitive composition and image formation method using this |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6194178A JPS54153622A (en) | 1978-05-24 | 1978-05-24 | Photosensitive composition and image formation method using this |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54153622A true JPS54153622A (en) | 1979-12-04 |
Family
ID=13185709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6194178A Pending JPS54153622A (en) | 1978-05-24 | 1978-05-24 | Photosensitive composition and image formation method using this |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54153622A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61275747A (en) * | 1985-05-30 | 1986-12-05 | Nec Corp | Negative type resist material |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4843126A (en) * | 1971-10-04 | 1973-06-22 | ||
JPS5110489A (en) * | 1974-07-15 | 1976-01-27 | Mitsubishi Electric Corp | JIDOSET SUDANSOCHI |
JPS5323632A (en) * | 1976-08-18 | 1978-03-04 | Fuji Photo Film Co Ltd | Image formation using peeling phenomenon |
-
1978
- 1978-05-24 JP JP6194178A patent/JPS54153622A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4843126A (en) * | 1971-10-04 | 1973-06-22 | ||
JPS5110489A (en) * | 1974-07-15 | 1976-01-27 | Mitsubishi Electric Corp | JIDOSET SUDANSOCHI |
JPS5323632A (en) * | 1976-08-18 | 1978-03-04 | Fuji Photo Film Co Ltd | Image formation using peeling phenomenon |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61275747A (en) * | 1985-05-30 | 1986-12-05 | Nec Corp | Negative type resist material |
JPH0584513B2 (en) * | 1985-05-30 | 1993-12-02 | Nippon Electric Co |
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