JPS54153622A - Photosensitive composition and image formation method using this - Google Patents

Photosensitive composition and image formation method using this

Info

Publication number
JPS54153622A
JPS54153622A JP6194178A JP6194178A JPS54153622A JP S54153622 A JPS54153622 A JP S54153622A JP 6194178 A JP6194178 A JP 6194178A JP 6194178 A JP6194178 A JP 6194178A JP S54153622 A JPS54153622 A JP S54153622A
Authority
JP
Japan
Prior art keywords
base
photosensitive composition
film
image formation
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6194178A
Other languages
Japanese (ja)
Inventor
Takahiro Tsunoda
Tsugio Yamaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP6194178A priority Critical patent/JPS54153622A/en
Publication of JPS54153622A publication Critical patent/JPS54153622A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To enable an image of high resolution to be formed on a base by stripping development using a polyhalogen compound, a polymer plasticizer having phenolic rings and/or a naphthol derivative.
CONSTITUTION: The layer of photosensitive composition containing a polymer havig phenol rings, e.g. a m-cresol type novolak resin, a polyhalogen compound, preferably in an amount of 5 to 30% wt. based on the resin, e.g. CHI3, and α- naphthol or a plasticizer, such as phthalic acid esters is prepared on a proper base and covered with a transparent cover film. This photosensitive image formation material is imagewise sxposed throught the transparent cover film, then heated preferably to 60 to 85°C, and stripped of the film when it is hot. The exposed area of the photosensitive composition layer is sticked to the film and revomed from the base. On the other hand, its unexposed area remains on the base and forms a relief image.
COPYRIGHT: (C)1979,JPO&Japio
JP6194178A 1978-05-24 1978-05-24 Photosensitive composition and image formation method using this Pending JPS54153622A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6194178A JPS54153622A (en) 1978-05-24 1978-05-24 Photosensitive composition and image formation method using this

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6194178A JPS54153622A (en) 1978-05-24 1978-05-24 Photosensitive composition and image formation method using this

Publications (1)

Publication Number Publication Date
JPS54153622A true JPS54153622A (en) 1979-12-04

Family

ID=13185709

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6194178A Pending JPS54153622A (en) 1978-05-24 1978-05-24 Photosensitive composition and image formation method using this

Country Status (1)

Country Link
JP (1) JPS54153622A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61275747A (en) * 1985-05-30 1986-12-05 Nec Corp Negative type resist material

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4843126A (en) * 1971-10-04 1973-06-22
JPS5110489A (en) * 1974-07-15 1976-01-27 Mitsubishi Electric Corp JIDOSET SUDANSOCHI
JPS5323632A (en) * 1976-08-18 1978-03-04 Fuji Photo Film Co Ltd Image formation using peeling phenomenon

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4843126A (en) * 1971-10-04 1973-06-22
JPS5110489A (en) * 1974-07-15 1976-01-27 Mitsubishi Electric Corp JIDOSET SUDANSOCHI
JPS5323632A (en) * 1976-08-18 1978-03-04 Fuji Photo Film Co Ltd Image formation using peeling phenomenon

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61275747A (en) * 1985-05-30 1986-12-05 Nec Corp Negative type resist material
JPH0584513B2 (en) * 1985-05-30 1993-12-02 Nippon Electric Co

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