JPS5785049A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS5785049A JPS5785049A JP16293980A JP16293980A JPS5785049A JP S5785049 A JPS5785049 A JP S5785049A JP 16293980 A JP16293980 A JP 16293980A JP 16293980 A JP16293980 A JP 16293980A JP S5785049 A JPS5785049 A JP S5785049A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- resin
- photosensitive composition
- polyphenol
- introducing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
PURPOSE: To obtain a photosensitive composition superior in developability, sensitivity, plate making performance, etc., by introducing o-naphthoquinone- diazide-sulfonyl groups to a polyphenol-aldehyde resin, and adding an acid or acid anhydride and a small amount of a specified aromatic diazonium salt to said resin.
CONSTITUTION: A photosensitive composition contains 1W40pts.wt. o-naphthoquinonediazide compound (NQ) obtained by introducing o-naphthoquinonediazide- sulfonyl groups to a polyphenol-aldehyde resin; 1W30% dye capable of forming acid and salt basing on NQ; a novolak resin; a small amount of 1.0W8.0% (of NQ) aromatic diazonium having phosphorus fluoride ion, boron fluoride ion, tin chloride ion, zinc chloride ion, or the like as an anionic member of the diazonium salt; and an inorganic or organic acid or acid anhydride. This composition is used for preparation of a PS plate, etc., thus permitting a photosensitive material superior in storage stability capable of forming a high contrast visible image after exposure to be obtained.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16293980A JPS5785049A (en) | 1980-11-18 | 1980-11-18 | Photosensitive composition |
DE19813144657 DE3144657A1 (en) | 1980-11-18 | 1981-11-10 | Photosensitive composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16293980A JPS5785049A (en) | 1980-11-18 | 1980-11-18 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5785049A true JPS5785049A (en) | 1982-05-27 |
Family
ID=15764113
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16293980A Pending JPS5785049A (en) | 1980-11-18 | 1980-11-18 | Photosensitive composition |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5785049A (en) |
DE (1) | DE3144657A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61235832A (en) * | 1985-04-10 | 1986-10-21 | Konishiroku Photo Ind Co Ltd | Photosensitive composition and photosensitive lithographic plate |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4460674A (en) * | 1981-01-16 | 1984-07-17 | Konishiroku Photo Industry Co., Ltd. | Posi-type quinone diazide photosensitive composition with sensitizer therefor |
DE3584306D1 (en) * | 1984-05-14 | 1991-11-14 | Toshiba Kawasaki Kk | PROCESS FOR PRODUCING PROTECTIVE LACQUER IMAGES AND COMPOSITION THEREFOR. |
US5188924A (en) * | 1984-05-14 | 1993-02-23 | Kabushiki Kaisha Toshiba | Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt |
IT1248758B (en) * | 1990-06-07 | 1995-01-27 | Plurimetal Srl | PHOTOSENSITIVE MIXTURES |
CN1083777C (en) * | 1995-11-24 | 2002-05-01 | 霍西尔绘图工业有限公司 | Hydrophilized support for planographic printing plates and its preparation |
GB9624224D0 (en) * | 1996-11-21 | 1997-01-08 | Horsell Graphic Ind Ltd | Planographic printing |
GB9702568D0 (en) * | 1997-02-07 | 1997-03-26 | Horsell Graphic Ind Ltd | Planographic printing |
US6357351B1 (en) | 1997-05-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Substrate for planographic printing |
US6293197B1 (en) | 1999-08-17 | 2001-09-25 | Kodak Polychrome Graphics | Hydrophilized substrate for planographic printing |
US7294447B2 (en) | 2001-09-24 | 2007-11-13 | Agfa Graphics Nv | Positive-working lithographic printing plate precursor |
-
1980
- 1980-11-18 JP JP16293980A patent/JPS5785049A/en active Pending
-
1981
- 1981-11-10 DE DE19813144657 patent/DE3144657A1/en not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61235832A (en) * | 1985-04-10 | 1986-10-21 | Konishiroku Photo Ind Co Ltd | Photosensitive composition and photosensitive lithographic plate |
JPH0533789B2 (en) * | 1985-04-10 | 1993-05-20 | Konishiroku Photo Ind |
Also Published As
Publication number | Publication date |
---|---|
DE3144657A1 (en) | 1982-09-02 |
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