JPS5785049A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS5785049A
JPS5785049A JP16293980A JP16293980A JPS5785049A JP S5785049 A JPS5785049 A JP S5785049A JP 16293980 A JP16293980 A JP 16293980A JP 16293980 A JP16293980 A JP 16293980A JP S5785049 A JPS5785049 A JP S5785049A
Authority
JP
Japan
Prior art keywords
acid
resin
photosensitive composition
polyphenol
introducing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16293980A
Other languages
Japanese (ja)
Inventor
Sei Goto
Takeshi Yamamoto
Noriyasu Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP16293980A priority Critical patent/JPS5785049A/en
Priority to DE19813144657 priority patent/DE3144657A1/en
Publication of JPS5785049A publication Critical patent/JPS5785049A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

PURPOSE: To obtain a photosensitive composition superior in developability, sensitivity, plate making performance, etc., by introducing o-naphthoquinone- diazide-sulfonyl groups to a polyphenol-aldehyde resin, and adding an acid or acid anhydride and a small amount of a specified aromatic diazonium salt to said resin.
CONSTITUTION: A photosensitive composition contains 1W40pts.wt. o-naphthoquinonediazide compound (NQ) obtained by introducing o-naphthoquinonediazide- sulfonyl groups to a polyphenol-aldehyde resin; 1W30% dye capable of forming acid and salt basing on NQ; a novolak resin; a small amount of 1.0W8.0% (of NQ) aromatic diazonium having phosphorus fluoride ion, boron fluoride ion, tin chloride ion, zinc chloride ion, or the like as an anionic member of the diazonium salt; and an inorganic or organic acid or acid anhydride. This composition is used for preparation of a PS plate, etc., thus permitting a photosensitive material superior in storage stability capable of forming a high contrast visible image after exposure to be obtained.
COPYRIGHT: (C)1982,JPO&Japio
JP16293980A 1980-11-18 1980-11-18 Photosensitive composition Pending JPS5785049A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP16293980A JPS5785049A (en) 1980-11-18 1980-11-18 Photosensitive composition
DE19813144657 DE3144657A1 (en) 1980-11-18 1981-11-10 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16293980A JPS5785049A (en) 1980-11-18 1980-11-18 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS5785049A true JPS5785049A (en) 1982-05-27

Family

ID=15764113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16293980A Pending JPS5785049A (en) 1980-11-18 1980-11-18 Photosensitive composition

Country Status (2)

Country Link
JP (1) JPS5785049A (en)
DE (1) DE3144657A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61235832A (en) * 1985-04-10 1986-10-21 Konishiroku Photo Ind Co Ltd Photosensitive composition and photosensitive lithographic plate

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4460674A (en) * 1981-01-16 1984-07-17 Konishiroku Photo Industry Co., Ltd. Posi-type quinone diazide photosensitive composition with sensitizer therefor
DE3584306D1 (en) * 1984-05-14 1991-11-14 Toshiba Kawasaki Kk PROCESS FOR PRODUCING PROTECTIVE LACQUER IMAGES AND COMPOSITION THEREFOR.
US5188924A (en) * 1984-05-14 1993-02-23 Kabushiki Kaisha Toshiba Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
IT1248758B (en) * 1990-06-07 1995-01-27 Plurimetal Srl PHOTOSENSITIVE MIXTURES
CN1083777C (en) * 1995-11-24 2002-05-01 霍西尔绘图工业有限公司 Hydrophilized support for planographic printing plates and its preparation
GB9624224D0 (en) * 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing
US7294447B2 (en) 2001-09-24 2007-11-13 Agfa Graphics Nv Positive-working lithographic printing plate precursor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61235832A (en) * 1985-04-10 1986-10-21 Konishiroku Photo Ind Co Ltd Photosensitive composition and photosensitive lithographic plate
JPH0533789B2 (en) * 1985-04-10 1993-05-20 Konishiroku Photo Ind

Also Published As

Publication number Publication date
DE3144657A1 (en) 1982-09-02

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