Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co LtdfiledCriticalToshiba Corp
Priority to JP14064476ApriorityCriticalpatent/JPS5365665A/en
Publication of JPS5365665ApublicationCriticalpatent/JPS5365665A/en
PURPOSE: To enable the solution and exfoliation due to trichlene or xylene by heating up the exposed resist film to more than a fixed temperature, and thus to reduce the manufacture processes as well as to avoid the evil effect to the substrate surface caused by the exclusive exfoliation liquid.
COPYRIGHT: (C)1978,JPO&Japio
JP14064476A1976-11-251976-11-25Exfoliation of photo resist film
PendingJPS5365665A
(en)