JPS569740A - Image forming method - Google Patents
Image forming methodInfo
- Publication number
- JPS569740A JPS569740A JP8539579A JP8539579A JPS569740A JP S569740 A JPS569740 A JP S569740A JP 8539579 A JP8539579 A JP 8539579A JP 8539579 A JP8539579 A JP 8539579A JP S569740 A JPS569740 A JP S569740A
- Authority
- JP
- Japan
- Prior art keywords
- developed
- image
- composition layer
- naphthoquinone
- photosensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 abstract 3
- 125000005626 carbonium group Chemical group 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- -1 quinone diazide compound Chemical class 0.000 abstract 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 abstract 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 abstract 1
- 229940107698 malachite green Drugs 0.000 abstract 1
- 230000003245 working effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8539579A JPS569740A (en) | 1979-07-05 | 1979-07-05 | Image forming method |
US06/166,517 US4356254A (en) | 1979-07-05 | 1980-07-07 | Image-forming method using o-quinone diazide and basic carbonium dye |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8539579A JPS569740A (en) | 1979-07-05 | 1979-07-05 | Image forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS569740A true JPS569740A (en) | 1981-01-31 |
JPS6249615B2 JPS6249615B2 (ja) | 1987-10-20 |
Family
ID=13857574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8539579A Granted JPS569740A (en) | 1979-07-05 | 1979-07-05 | Image forming method |
Country Status (2)
Country | Link |
---|---|
US (1) | US4356254A (ja) |
JP (1) | JPS569740A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6039641A (ja) * | 1983-07-11 | 1985-03-01 | ヘキスト・アクチエンゲゼルシヤフト | ネガチブレリーフコピーの製造方法 |
JPS60173545A (ja) * | 1983-11-08 | 1985-09-06 | ヘキスト アクチエンゲゼルシヤフト | 感光性組成物及びネガチブレリ−フコピ−の製法 |
JPS60263143A (ja) * | 1984-06-01 | 1985-12-26 | ローム アンド ハース コンパニー | 熱安定性重合体像及びその形成方法 |
JPS62129849A (ja) * | 1985-12-02 | 1987-06-12 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジストパタ−ンの安定化方法 |
JPH01147453A (ja) * | 1987-10-21 | 1989-06-09 | Samsung Semiconductor & Teleommun Co Ltd | 陽性感光性樹脂を利用した陰性パターン形成方法 |
US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5560944A (en) * | 1978-10-31 | 1980-05-08 | Fuji Photo Film Co Ltd | Image forming method |
US4377633A (en) * | 1981-08-24 | 1983-03-22 | International Business Machines Corporation | Methods of simultaneous contact and metal lithography patterning |
DE3134054A1 (de) * | 1981-08-28 | 1983-05-05 | Hoechst Ag, 6230 Frankfurt | Elektrochemisches entwicklungsverfahren fuer reproduktionsschichten |
DE3151078A1 (de) * | 1981-12-23 | 1983-07-28 | Hoechst Ag, 6230 Frankfurt | Verfahren zur herstellung von reliefbildern |
JPS5984241A (ja) * | 1982-11-05 | 1984-05-15 | Fuji Photo Film Co Ltd | 感光性平版印刷版の現像液 |
DE3248247A1 (de) * | 1982-12-28 | 1984-06-28 | Basf Ag, 6700 Ludwigshafen | Farbstoff enthaltende schicht einer photopolymerisierbaren mischung und verfahren zur herstellung von relief- und druckformen |
DE3248257A1 (de) * | 1982-12-28 | 1984-06-28 | Robert Bosch Gmbh, 7000 Stuttgart | Druckregelventil |
JPS6088941A (ja) * | 1983-10-21 | 1985-05-18 | Nagase Kasei Kogyo Kk | フオトレジスト組成物 |
US4931380A (en) * | 1985-07-18 | 1990-06-05 | Microsi, Inc. | Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist |
NL8601096A (nl) * | 1986-04-29 | 1987-11-16 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleiderinrichting waarbij op een halfgeleidersubstraat een negatief beeld wordt gevormd in een positieve fotolak. |
US4729940A (en) * | 1986-05-16 | 1988-03-08 | Cbs Inc. | Method of manufacturing master for optical information carrier |
US5156942A (en) * | 1989-07-11 | 1992-10-20 | Texas Instruments Incorporated | Extended source E-beam mask imaging system and method |
DE4013575C2 (de) * | 1990-04-27 | 1994-08-11 | Basf Ag | Verfahren zur Herstellung negativer Reliefkopien |
JP2720224B2 (ja) * | 1990-06-15 | 1998-03-04 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
JP3016256B2 (ja) * | 1991-01-11 | 2000-03-06 | 日本ビクター株式会社 | 高密度記録ディスク用スタンパとその製造方法 |
JP3461377B2 (ja) * | 1994-04-18 | 2003-10-27 | 富士写真フイルム株式会社 | 画像記録材料 |
CA2225567C (en) | 1996-04-23 | 2003-01-21 | Horsell Graphic Industries Limited | Heat-sensitive composition and method of making a lithographic printing form with it |
US5858626A (en) * | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
US5705322A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Method of providing an image using a negative-working infrared photosensitive element |
US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
JP2002510404A (ja) | 1997-07-05 | 2002-04-02 | コダック・ポリクローム・グラフィックス・カンパニー・リミテッド | パターン形成方法および放射線感受性材料 |
US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
US6884561B2 (en) | 2000-01-12 | 2005-04-26 | Anocoil Corporation | Actinically imageable and infrared heated printing plate |
US6315916B1 (en) | 2000-05-08 | 2001-11-13 | Pisces-Print Image Sciences, Inc. | Chemical imaging of a lithographic printing plate |
US6691618B2 (en) | 2000-05-08 | 2004-02-17 | Pisces-Print Imaging Sciences, Inc. | Chemical imaging of a lithographic printing plate |
US20040154489A1 (en) * | 2000-05-08 | 2004-08-12 | Deutsch Albert S. | Chemical imaging of a lithographic printing plate |
US20050037293A1 (en) * | 2000-05-08 | 2005-02-17 | Deutsch Albert S. | Ink jet imaging of a lithographic printing plate |
JP4584478B2 (ja) * | 2001-03-19 | 2010-11-24 | コダック株式会社 | 画像形成方法 |
US6677106B2 (en) | 2002-01-03 | 2004-01-13 | Kodak Polychrome Graphics Llc | Method and equipment for using photo- or thermally imagable, negatively working patterning compositions |
US6599676B2 (en) | 2002-01-03 | 2003-07-29 | Kodak Polychrome Graphics Llc | Process for making thermal negative printing plate |
US7157213B2 (en) * | 2004-03-01 | 2007-01-02 | Think Laboratory Co., Ltd. | Developer agent for positive type photosensitive compound |
EP1574907A1 (en) * | 2004-03-08 | 2005-09-14 | Think Laboratory Co., Ltd. | Developing agent for positive-type photosensitive composition |
US20070082432A1 (en) * | 2005-09-06 | 2007-04-12 | Lee Wai M | Variable exposure photolithography |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
US3567453A (en) * | 1967-12-26 | 1971-03-02 | Eastman Kodak Co | Light sensitive compositions for photoresists and lithography |
US3669658A (en) * | 1969-06-11 | 1972-06-13 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
JPS5024641B2 (ja) * | 1972-10-17 | 1975-08-18 | ||
DE2331377C2 (de) * | 1973-06-20 | 1982-10-14 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Kopiermaterial |
US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
DE2607207C2 (de) * | 1976-02-23 | 1983-07-14 | Hoechst Ag, 6230 Frankfurt | Verfahren zur Herstellung von Flachdruckformen mit Laserstrahlen |
-
1979
- 1979-07-05 JP JP8539579A patent/JPS569740A/ja active Granted
-
1980
- 1980-07-07 US US06/166,517 patent/US4356254A/en not_active Expired - Lifetime
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6039641A (ja) * | 1983-07-11 | 1985-03-01 | ヘキスト・アクチエンゲゼルシヤフト | ネガチブレリーフコピーの製造方法 |
JPH0455501B2 (ja) * | 1983-07-11 | 1992-09-03 | Hoechst Ag | |
JPS60173545A (ja) * | 1983-11-08 | 1985-09-06 | ヘキスト アクチエンゲゼルシヤフト | 感光性組成物及びネガチブレリ−フコピ−の製法 |
JPH0431381B2 (ja) * | 1983-11-08 | 1992-05-26 | ||
JPS60263143A (ja) * | 1984-06-01 | 1985-12-26 | ローム アンド ハース コンパニー | 熱安定性重合体像及びその形成方法 |
JPS62129849A (ja) * | 1985-12-02 | 1987-06-12 | Tokyo Ohka Kogyo Co Ltd | ポジ型ホトレジストパタ−ンの安定化方法 |
JPH01147453A (ja) * | 1987-10-21 | 1989-06-09 | Samsung Semiconductor & Teleommun Co Ltd | 陽性感光性樹脂を利用した陰性パターン形成方法 |
US5286609A (en) * | 1988-11-01 | 1994-02-15 | Yamatoya & Co., Ltd. | Process for the formation of a negative resist pattern from a composition comprising a diazoquinone compound and an imidazole and having as a heat step the use of a hot water containing spray |
Also Published As
Publication number | Publication date |
---|---|
JPS6249615B2 (ja) | 1987-10-20 |
US4356254A (en) | 1982-10-26 |
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