JPS5694641A - Semiconductor device for testing reliability - Google Patents
Semiconductor device for testing reliabilityInfo
- Publication number
- JPS5694641A JPS5694641A JP17166679A JP17166679A JPS5694641A JP S5694641 A JPS5694641 A JP S5694641A JP 17166679 A JP17166679 A JP 17166679A JP 17166679 A JP17166679 A JP 17166679A JP S5694641 A JPS5694641 A JP S5694641A
- Authority
- JP
- Japan
- Prior art keywords
- layers
- electrodes
- substrate
- electric charge
- parallel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Abstract
PURPOSE:To expedite a test for reliability by arranging two or more electrodes on the insulation film of an n type Si substrate having p-layers parallel to each other in such a manner that they intersect the longitudinal direction of the p-layers and face each other within a part between the p-layers and by sealing them with an insulation film. CONSTITUTION:The parallel p<+> layers 12a and 12b are provided on the n<-> type Si substrate 11, while the parallel Al electrodes 14a and 14b are made on an SiO2 film 13. The electrodes 14a and 14b cross the p<+> layers 12a and 12b at a right angle and face each other in the part between the layers. The Al electrodes 14a and 14b and the substrate 11 are sealed with a resin layer 15. When prescribed negative potential is given to the electrodes 14a and 14b, the electric charge of the sealing resin itself is accumulated in an area between the layers 12a and 12b and thereby the electric charge can be accumulated concentratedly on the surface of the SiO2 film 13. Therefore, even when the volume of the electric charge of the sealing resin itself is small, an inversion layer can be formed on the surface of the substrate between the layers 12a and 12b in a short time, and when the SiO2 film 13 is made thin, a threshold value for forming of the inversion layer can be lowered. By this constitution, an accurate index for control concerning the sealing can be found rapidly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17166679A JPS5694641A (en) | 1979-12-27 | 1979-12-27 | Semiconductor device for testing reliability |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17166679A JPS5694641A (en) | 1979-12-27 | 1979-12-27 | Semiconductor device for testing reliability |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5694641A true JPS5694641A (en) | 1981-07-31 |
Family
ID=15927441
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17166679A Pending JPS5694641A (en) | 1979-12-27 | 1979-12-27 | Semiconductor device for testing reliability |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5694641A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6272135A (en) * | 1985-09-25 | 1987-04-02 | Matsushita Electric Works Ltd | Mos type semiconductor element |
CN102928669A (en) * | 2012-10-25 | 2013-02-13 | 上海宏力半导体制造有限公司 | Resistivity test method and resistivity test structure for semiconductor silicon wafer |
-
1979
- 1979-12-27 JP JP17166679A patent/JPS5694641A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6272135A (en) * | 1985-09-25 | 1987-04-02 | Matsushita Electric Works Ltd | Mos type semiconductor element |
CN102928669A (en) * | 2012-10-25 | 2013-02-13 | 上海宏力半导体制造有限公司 | Resistivity test method and resistivity test structure for semiconductor silicon wafer |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5227654A (en) | Electrooptical cell | |
JPS5743470A (en) | Semiconductor device | |
JPS6425473A (en) | Charge transfer device | |
DE3469228D1 (en) | Method for measaring the electric resistance of thin metallic layers, made under the influence of a plasma, during their fabrication | |
JPS5694641A (en) | Semiconductor device for testing reliability | |
JPS5775438A (en) | Semiconductor element | |
GB933470A (en) | Improvements relating to glass sandwiches primarily for windows of optical instruments | |
JPS5776878A (en) | Semiconductor memory device | |
JPS5242381A (en) | Semiconductor storage device | |
JPS56111261A (en) | Thin film field effect semiconductor device | |
JPS56129380A (en) | Semiconductor radioactive rays detector | |
JPS57111884A (en) | Semiconductor storage device | |
JPS5734373A (en) | Silicon diaphragm | |
JPS56110288A (en) | Semiconductor laser element | |
JPS5691459A (en) | Semiconductor device | |
JPS52129383A (en) | Mis semicnductor integrated circuit device | |
JPS5731173A (en) | Semiconductor device | |
JPS57100741A (en) | Semiconductor element for reliability evaluation | |
JPS5759380A (en) | Thin film type thyristor | |
JPS5260575A (en) | Charge transfer device | |
JPS5341191A (en) | Electric charge transfer device | |
JPS5771180A (en) | Input protective circuit device | |
JPS53129983A (en) | Charge coupled element and production of the same | |
JPS5749915A (en) | Image converting element | |
JPS57208175A (en) | Semiconductor device |