JPS5694641A - Semiconductor device for testing reliability - Google Patents

Semiconductor device for testing reliability

Info

Publication number
JPS5694641A
JPS5694641A JP17166679A JP17166679A JPS5694641A JP S5694641 A JPS5694641 A JP S5694641A JP 17166679 A JP17166679 A JP 17166679A JP 17166679 A JP17166679 A JP 17166679A JP S5694641 A JPS5694641 A JP S5694641A
Authority
JP
Japan
Prior art keywords
layers
electrodes
substrate
electric charge
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17166679A
Other languages
Japanese (ja)
Inventor
Mitsuaki Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP17166679A priority Critical patent/JPS5694641A/en
Publication of JPS5694641A publication Critical patent/JPS5694641A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Abstract

PURPOSE:To expedite a test for reliability by arranging two or more electrodes on the insulation film of an n type Si substrate having p-layers parallel to each other in such a manner that they intersect the longitudinal direction of the p-layers and face each other within a part between the p-layers and by sealing them with an insulation film. CONSTITUTION:The parallel p<+> layers 12a and 12b are provided on the n<-> type Si substrate 11, while the parallel Al electrodes 14a and 14b are made on an SiO2 film 13. The electrodes 14a and 14b cross the p<+> layers 12a and 12b at a right angle and face each other in the part between the layers. The Al electrodes 14a and 14b and the substrate 11 are sealed with a resin layer 15. When prescribed negative potential is given to the electrodes 14a and 14b, the electric charge of the sealing resin itself is accumulated in an area between the layers 12a and 12b and thereby the electric charge can be accumulated concentratedly on the surface of the SiO2 film 13. Therefore, even when the volume of the electric charge of the sealing resin itself is small, an inversion layer can be formed on the surface of the substrate between the layers 12a and 12b in a short time, and when the SiO2 film 13 is made thin, a threshold value for forming of the inversion layer can be lowered. By this constitution, an accurate index for control concerning the sealing can be found rapidly.
JP17166679A 1979-12-27 1979-12-27 Semiconductor device for testing reliability Pending JPS5694641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17166679A JPS5694641A (en) 1979-12-27 1979-12-27 Semiconductor device for testing reliability

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17166679A JPS5694641A (en) 1979-12-27 1979-12-27 Semiconductor device for testing reliability

Publications (1)

Publication Number Publication Date
JPS5694641A true JPS5694641A (en) 1981-07-31

Family

ID=15927441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17166679A Pending JPS5694641A (en) 1979-12-27 1979-12-27 Semiconductor device for testing reliability

Country Status (1)

Country Link
JP (1) JPS5694641A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6272135A (en) * 1985-09-25 1987-04-02 Matsushita Electric Works Ltd Mos type semiconductor element
CN102928669A (en) * 2012-10-25 2013-02-13 上海宏力半导体制造有限公司 Resistivity test method and resistivity test structure for semiconductor silicon wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6272135A (en) * 1985-09-25 1987-04-02 Matsushita Electric Works Ltd Mos type semiconductor element
CN102928669A (en) * 2012-10-25 2013-02-13 上海宏力半导体制造有限公司 Resistivity test method and resistivity test structure for semiconductor silicon wafer

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