JPS5691366A - Ion injector - Google Patents
Ion injectorInfo
- Publication number
- JPS5691366A JPS5691366A JP16812279A JP16812279A JPS5691366A JP S5691366 A JPS5691366 A JP S5691366A JP 16812279 A JP16812279 A JP 16812279A JP 16812279 A JP16812279 A JP 16812279A JP S5691366 A JPS5691366 A JP S5691366A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- wafer
- grid
- irradiation
- insulator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Abstract
PURPOSE:To inject equally ion into a wafer by providing a grid device for detecting ion beams before the wafer, said device having grid points covered with an insulator; and detecting ion beam when it is passed through. CONSTITUTION:The desired ion alone among many kinds of ions generated in an ion source head 1 is treated in the electromagnetic field by an analyzer 2, led to a path 11, accelerated by an accelerator 3, and rediated over the surface of the wafer 8 while being scanned by a scanner 4. A grid device 12, where each of grid is coated with an insulator, is provided in front of the wafer 8, and connected with a control circuit 13. Accordingly, the radiated ion beam is detected by each grid line in order and rembered in the memory of the control circuit 13. When unequality in the irradiation distribution is detected, irradiation is carried out again on the place lacking in ion irradiation. Therefore, ion can be equally injected.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16812279A JPS5691366A (en) | 1979-12-26 | 1979-12-26 | Ion injector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16812279A JPS5691366A (en) | 1979-12-26 | 1979-12-26 | Ion injector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5691366A true JPS5691366A (en) | 1981-07-24 |
Family
ID=15862251
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16812279A Pending JPS5691366A (en) | 1979-12-26 | 1979-12-26 | Ion injector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5691366A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006126997A1 (en) * | 2004-05-20 | 2006-11-30 | Axcelis Technologies, Inc. | Two dimensional stationary beam profile and angular mapping |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4934190A (en) * | 1972-08-01 | 1974-03-29 | ||
JPS5148975A (en) * | 1974-10-25 | 1976-04-27 | Tokyo Shibaura Electric Co | SOSAKADENRYUSHIBIIMUNO BUNPUSOKUTE ISOCHI |
-
1979
- 1979-12-26 JP JP16812279A patent/JPS5691366A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4934190A (en) * | 1972-08-01 | 1974-03-29 | ||
JPS5148975A (en) * | 1974-10-25 | 1976-04-27 | Tokyo Shibaura Electric Co | SOSAKADENRYUSHIBIIMUNO BUNPUSOKUTE ISOCHI |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2006126997A1 (en) * | 2004-05-20 | 2006-11-30 | Axcelis Technologies, Inc. | Two dimensional stationary beam profile and angular mapping |
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