JPS5691366A - Ion injector - Google Patents

Ion injector

Info

Publication number
JPS5691366A
JPS5691366A JP16812279A JP16812279A JPS5691366A JP S5691366 A JPS5691366 A JP S5691366A JP 16812279 A JP16812279 A JP 16812279A JP 16812279 A JP16812279 A JP 16812279A JP S5691366 A JPS5691366 A JP S5691366A
Authority
JP
Japan
Prior art keywords
ion
wafer
grid
irradiation
insulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16812279A
Other languages
Japanese (ja)
Inventor
Shinichi Miyashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16812279A priority Critical patent/JPS5691366A/en
Publication of JPS5691366A publication Critical patent/JPS5691366A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Abstract

PURPOSE:To inject equally ion into a wafer by providing a grid device for detecting ion beams before the wafer, said device having grid points covered with an insulator; and detecting ion beam when it is passed through. CONSTITUTION:The desired ion alone among many kinds of ions generated in an ion source head 1 is treated in the electromagnetic field by an analyzer 2, led to a path 11, accelerated by an accelerator 3, and rediated over the surface of the wafer 8 while being scanned by a scanner 4. A grid device 12, where each of grid is coated with an insulator, is provided in front of the wafer 8, and connected with a control circuit 13. Accordingly, the radiated ion beam is detected by each grid line in order and rembered in the memory of the control circuit 13. When unequality in the irradiation distribution is detected, irradiation is carried out again on the place lacking in ion irradiation. Therefore, ion can be equally injected.
JP16812279A 1979-12-26 1979-12-26 Ion injector Pending JPS5691366A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16812279A JPS5691366A (en) 1979-12-26 1979-12-26 Ion injector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16812279A JPS5691366A (en) 1979-12-26 1979-12-26 Ion injector

Publications (1)

Publication Number Publication Date
JPS5691366A true JPS5691366A (en) 1981-07-24

Family

ID=15862251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16812279A Pending JPS5691366A (en) 1979-12-26 1979-12-26 Ion injector

Country Status (1)

Country Link
JP (1) JPS5691366A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006126997A1 (en) * 2004-05-20 2006-11-30 Axcelis Technologies, Inc. Two dimensional stationary beam profile and angular mapping

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934190A (en) * 1972-08-01 1974-03-29
JPS5148975A (en) * 1974-10-25 1976-04-27 Tokyo Shibaura Electric Co SOSAKADENRYUSHIBIIMUNO BUNPUSOKUTE ISOCHI

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934190A (en) * 1972-08-01 1974-03-29
JPS5148975A (en) * 1974-10-25 1976-04-27 Tokyo Shibaura Electric Co SOSAKADENRYUSHIBIIMUNO BUNPUSOKUTE ISOCHI

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006126997A1 (en) * 2004-05-20 2006-11-30 Axcelis Technologies, Inc. Two dimensional stationary beam profile and angular mapping

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