JPS5677844A - Resist pattern forming method - Google Patents

Resist pattern forming method

Info

Publication number
JPS5677844A
JPS5677844A JP15418979A JP15418979A JPS5677844A JP S5677844 A JPS5677844 A JP S5677844A JP 15418979 A JP15418979 A JP 15418979A JP 15418979 A JP15418979 A JP 15418979A JP S5677844 A JPS5677844 A JP S5677844A
Authority
JP
Japan
Prior art keywords
forming method
resist pattern
pattern forming
sulfone
polyolefin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15418979A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6134655B2 (enrdf_load_stackoverflow
Inventor
Kazuo Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15418979A priority Critical patent/JPS5677844A/ja
Publication of JPS5677844A publication Critical patent/JPS5677844A/ja
Publication of JPS6134655B2 publication Critical patent/JPS6134655B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
JP15418979A 1979-11-30 1979-11-30 Resist pattern forming method Granted JPS5677844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15418979A JPS5677844A (en) 1979-11-30 1979-11-30 Resist pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15418979A JPS5677844A (en) 1979-11-30 1979-11-30 Resist pattern forming method

Publications (2)

Publication Number Publication Date
JPS5677844A true JPS5677844A (en) 1981-06-26
JPS6134655B2 JPS6134655B2 (enrdf_load_stackoverflow) 1986-08-08

Family

ID=15578773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15418979A Granted JPS5677844A (en) 1979-11-30 1979-11-30 Resist pattern forming method

Country Status (1)

Country Link
JP (1) JPS5677844A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081158A (ja) * 1983-10-11 1985-05-09 Hitachi Ltd 放射線感応物質
JPS60195940A (ja) * 1984-03-17 1985-10-04 Mitsubishi Electric Corp 微細パタ−ン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6081158A (ja) * 1983-10-11 1985-05-09 Hitachi Ltd 放射線感応物質
JPS60195940A (ja) * 1984-03-17 1985-10-04 Mitsubishi Electric Corp 微細パタ−ン形成方法

Also Published As

Publication number Publication date
JPS6134655B2 (enrdf_load_stackoverflow) 1986-08-08

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