JPS5666044A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5666044A
JPS5666044A JP14309079A JP14309079A JPS5666044A JP S5666044 A JPS5666044 A JP S5666044A JP 14309079 A JP14309079 A JP 14309079A JP 14309079 A JP14309079 A JP 14309079A JP S5666044 A JPS5666044 A JP S5666044A
Authority
JP
Japan
Prior art keywords
gas
damper
displacement
specified
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14309079A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6236634B2 (https=
Inventor
Terumi Rokushiya
Masatoshi Matsushita
Tatsumi Suganuma
Kensho Kyoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP14309079A priority Critical patent/JPS5666044A/ja
Publication of JPS5666044A publication Critical patent/JPS5666044A/ja
Publication of JPS6236634B2 publication Critical patent/JPS6236634B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP14309079A 1979-11-05 1979-11-05 Semiconductor device Granted JPS5666044A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14309079A JPS5666044A (en) 1979-11-05 1979-11-05 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14309079A JPS5666044A (en) 1979-11-05 1979-11-05 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS5666044A true JPS5666044A (en) 1981-06-04
JPS6236634B2 JPS6236634B2 (https=) 1987-08-07

Family

ID=15330673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14309079A Granted JPS5666044A (en) 1979-11-05 1979-11-05 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5666044A (https=)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950525A (ja) * 1982-09-16 1984-03-23 M Setetsuku Kk フオトレジストの塗布装置
JPS5950438U (ja) * 1982-09-24 1984-04-03 富士通株式会社 レジスト塗布装置
JPS5977223U (ja) * 1982-11-16 1984-05-25 ソニー株式会社 半導体洗浄装置
JPS5995629U (ja) * 1982-12-20 1984-06-28 株式会社東芝 レジスト塗布装置
JPS6088429A (ja) * 1983-10-20 1985-05-18 Fuji Electric Co Ltd 半導体塗布拡散方法
JPS61157380A (ja) * 1984-12-28 1986-07-17 Fujitsu Ltd 回転処理装置
JPS61160933A (ja) * 1985-01-08 1986-07-21 Nec Corp 現像処理装置
JPS61251135A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 自動現像装置
JPS62117323A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPS63119236A (ja) * 1987-10-08 1988-05-23 Fujitsu Ltd レジスト塗布方法
JPS63168025A (ja) * 1986-12-29 1988-07-12 Tokyo Electron Ltd 現像方法
JPH01244617A (ja) * 1988-03-25 1989-09-29 Tokyo Electron Ltd レジスト塗布方法
JPH07263338A (ja) * 1995-01-27 1995-10-13 Tokyo Electron Ltd 現像装置
JP2006216803A (ja) * 2005-02-04 2006-08-17 Daikin Ind Ltd 処理装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53166861U (https=) * 1977-06-01 1978-12-27
JPS542376U (https=) * 1977-06-08 1979-01-09
JPS5612206U (https=) * 1979-07-06 1981-02-02

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53166861U (https=) * 1977-06-01 1978-12-27
JPS542376U (https=) * 1977-06-08 1979-01-09
JPS5612206U (https=) * 1979-07-06 1981-02-02

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5950525A (ja) * 1982-09-16 1984-03-23 M Setetsuku Kk フオトレジストの塗布装置
JPS5950438U (ja) * 1982-09-24 1984-04-03 富士通株式会社 レジスト塗布装置
JPS5977223U (ja) * 1982-11-16 1984-05-25 ソニー株式会社 半導体洗浄装置
JPS5995629U (ja) * 1982-12-20 1984-06-28 株式会社東芝 レジスト塗布装置
JPS6088429A (ja) * 1983-10-20 1985-05-18 Fuji Electric Co Ltd 半導体塗布拡散方法
JPS61157380A (ja) * 1984-12-28 1986-07-17 Fujitsu Ltd 回転処理装置
JPS61160933A (ja) * 1985-01-08 1986-07-21 Nec Corp 現像処理装置
JPS61251135A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 自動現像装置
JPS62117323A (ja) * 1985-11-18 1987-05-28 Toshiba Corp 自動現像装置
JPS63168025A (ja) * 1986-12-29 1988-07-12 Tokyo Electron Ltd 現像方法
JPS63119236A (ja) * 1987-10-08 1988-05-23 Fujitsu Ltd レジスト塗布方法
JPH01244617A (ja) * 1988-03-25 1989-09-29 Tokyo Electron Ltd レジスト塗布方法
JPH07263338A (ja) * 1995-01-27 1995-10-13 Tokyo Electron Ltd 現像装置
JP2006216803A (ja) * 2005-02-04 2006-08-17 Daikin Ind Ltd 処理装置

Also Published As

Publication number Publication date
JPS6236634B2 (https=) 1987-08-07

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