JPS5655045A - Formation of pattern - Google Patents

Formation of pattern

Info

Publication number
JPS5655045A
JPS5655045A JP13103379A JP13103379A JPS5655045A JP S5655045 A JPS5655045 A JP S5655045A JP 13103379 A JP13103379 A JP 13103379A JP 13103379 A JP13103379 A JP 13103379A JP S5655045 A JPS5655045 A JP S5655045A
Authority
JP
Japan
Prior art keywords
film
polymerized
adherence
alpha
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13103379A
Other languages
Japanese (ja)
Inventor
Shuzo Oshio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13103379A priority Critical patent/JPS5655045A/en
Publication of JPS5655045A publication Critical patent/JPS5655045A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Abstract

PURPOSE:To form a fine pattern by forming a resist film of a lower layer of radiation sensitive high molecular material polymerized in a plasma and an upper layer of radiation sensitive high molecular material polymerized in a solution, thereby improving the adherence and eliminating pinholes. CONSTITUTION:A polymethylmethacrylate (PMMA) 12 polymerized in a plasma is formed on the surface of an oxide film 11 formed on an Si substrate 10, and a copolymer 13 of alpha-cyanoacrylate and alpha-amideacrylate is rotatably coated by a spinner as a solution polymerization film thereon. After the film is preliminarily heated, it is exposed and developed with an electron beam. Since the lower film 12 is thus improved in its adherence with reduced pinholes and the upper layer film 13 is reduced in thickness with high resolution, a fine pattern of an LSI can be readily formed.
JP13103379A 1979-10-11 1979-10-11 Formation of pattern Pending JPS5655045A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13103379A JPS5655045A (en) 1979-10-11 1979-10-11 Formation of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13103379A JPS5655045A (en) 1979-10-11 1979-10-11 Formation of pattern

Publications (1)

Publication Number Publication Date
JPS5655045A true JPS5655045A (en) 1981-05-15

Family

ID=15048441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13103379A Pending JPS5655045A (en) 1979-10-11 1979-10-11 Formation of pattern

Country Status (1)

Country Link
JP (1) JPS5655045A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0329313A2 (en) * 1988-02-05 1989-08-23 General Electric Company Laser patterning using a novel resist

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0329313A2 (en) * 1988-02-05 1989-08-23 General Electric Company Laser patterning using a novel resist
JPH024264A (en) * 1988-02-05 1990-01-09 General Electric Co (Ge) Double-layer resist construction and pattern formation

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