JPS5651871A - Manufacture of complementary type mos semiconductor device - Google Patents
Manufacture of complementary type mos semiconductor deviceInfo
- Publication number
- JPS5651871A JPS5651871A JP12803179A JP12803179A JPS5651871A JP S5651871 A JPS5651871 A JP S5651871A JP 12803179 A JP12803179 A JP 12803179A JP 12803179 A JP12803179 A JP 12803179A JP S5651871 A JPS5651871 A JP S5651871A
- Authority
- JP
- Japan
- Prior art keywords
- film
- region
- films
- sio2
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Electrodes Of Semiconductors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12803179A JPS5651871A (en) | 1979-10-05 | 1979-10-05 | Manufacture of complementary type mos semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12803179A JPS5651871A (en) | 1979-10-05 | 1979-10-05 | Manufacture of complementary type mos semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5651871A true JPS5651871A (en) | 1981-05-09 |
JPS6155783B2 JPS6155783B2 (enrdf_load_stackoverflow) | 1986-11-29 |
Family
ID=14974788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12803179A Granted JPS5651871A (en) | 1979-10-05 | 1979-10-05 | Manufacture of complementary type mos semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5651871A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59148369A (ja) * | 1983-02-10 | 1984-08-25 | シ−メンス,アクチエンゲゼルシヤフト | Mosトランジスタの製造方法 |
JPS6094379U (ja) * | 1983-12-01 | 1985-06-27 | 三菱電機株式会社 | プロセスライン用フラツシユ溶接機 |
-
1979
- 1979-10-05 JP JP12803179A patent/JPS5651871A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59148369A (ja) * | 1983-02-10 | 1984-08-25 | シ−メンス,アクチエンゲゼルシヤフト | Mosトランジスタの製造方法 |
JPS6094379U (ja) * | 1983-12-01 | 1985-06-27 | 三菱電機株式会社 | プロセスライン用フラツシユ溶接機 |
Also Published As
Publication number | Publication date |
---|---|
JPS6155783B2 (enrdf_load_stackoverflow) | 1986-11-29 |
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