JPS5649577A - Preparation of solid image pickup element - Google Patents

Preparation of solid image pickup element

Info

Publication number
JPS5649577A
JPS5649577A JP12590479A JP12590479A JPS5649577A JP S5649577 A JPS5649577 A JP S5649577A JP 12590479 A JP12590479 A JP 12590479A JP 12590479 A JP12590479 A JP 12590479A JP S5649577 A JPS5649577 A JP S5649577A
Authority
JP
Japan
Prior art keywords
image pickup
mask
pickup element
control gate
overflow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12590479A
Other languages
English (en)
Other versions
JPS6115588B2 (ja
Inventor
Hiroyuki Matsumoto
Yasuo Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP12590479A priority Critical patent/JPS5649577A/ja
Publication of JPS5649577A publication Critical patent/JPS5649577A/ja
Publication of JPS6115588B2 publication Critical patent/JPS6115588B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/148Charge coupled imagers
    • H01L27/14887Blooming suppression

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
JP12590479A 1979-09-28 1979-09-28 Preparation of solid image pickup element Granted JPS5649577A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12590479A JPS5649577A (en) 1979-09-28 1979-09-28 Preparation of solid image pickup element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12590479A JPS5649577A (en) 1979-09-28 1979-09-28 Preparation of solid image pickup element

Publications (2)

Publication Number Publication Date
JPS5649577A true JPS5649577A (en) 1981-05-06
JPS6115588B2 JPS6115588B2 (ja) 1986-04-24

Family

ID=14921778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12590479A Granted JPS5649577A (en) 1979-09-28 1979-09-28 Preparation of solid image pickup element

Country Status (1)

Country Link
JP (1) JPS5649577A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846670A (ja) * 1981-08-27 1983-03-18 ア−ルシ−エ−・コ−ポレ−シヨン 埋込みチヤンネル型電荷結合装置の製造法
JPH03504934A (ja) * 1988-08-25 1991-10-31 株式会社デニックス 歯科用レーザ装置
WO2010068252A1 (en) * 2008-12-10 2010-06-17 Eastman Kodak Company Image sensors with lateral overflow drains
US8772891B2 (en) 2008-12-10 2014-07-08 Truesense Imaging, Inc. Lateral overflow drain and channel stop regions in image sensors

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5846670A (ja) * 1981-08-27 1983-03-18 ア−ルシ−エ−・コ−ポレ−シヨン 埋込みチヤンネル型電荷結合装置の製造法
JPH03504934A (ja) * 1988-08-25 1991-10-31 株式会社デニックス 歯科用レーザ装置
WO2010068252A1 (en) * 2008-12-10 2010-06-17 Eastman Kodak Company Image sensors with lateral overflow drains
CN102246303A (zh) * 2008-12-10 2011-11-16 伊斯曼柯达公司 具有横向溢流排出通道的图像传感器
US8772891B2 (en) 2008-12-10 2014-07-08 Truesense Imaging, Inc. Lateral overflow drain and channel stop regions in image sensors
US8994139B2 (en) 2008-12-10 2015-03-31 Semiconductor Components Industries, Llc Lateral overflow drain and channel stop regions in image sensors
EP3182455A3 (en) * 2008-12-10 2017-08-30 Semiconductor Components Industries, LLC Image sensors with lateral overflow drains

Also Published As

Publication number Publication date
JPS6115588B2 (ja) 1986-04-24

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